Inventor
WEI-MIN LIU
Inventor
TW
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices31%
H01LSemiconductor devices24%
B82YSpecific uses or applications of nanostructures20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
H10BElectronic memory devices3%
A61BDiagnosis2%
C23CCoating metallic material2%
C30BSingle-crystal growth2%
G01SRadio direction-finding2%
G11BInformation storage based on relative movement between record carrier and transducer2%
PatentTitleYear
12,532,518Transistor source/drain regions and methods of forming the same202612,437,990Semiconductor device and method of manufacture202512,419,084Methods of forming transistor source/drain regions comprising carbon liner layers202512,396,242Nano-structure transistors with air inner spacers and methods forming same202512,336,237Source/drain regions of semiconductor device and method of forming the same202512,310,091Semiconductor device and method202512,302,615Epitaxial structures exposed in airgaps for semiconductor devices202512,255,255Method of manufacturing a FinFET with merged epitaxial source/drain regions202512,243,931Source/drain epitaxial layers for transistors202512,132,118Semiconductor device having a multilayer source/drain region and methods of manufacture202412,130,379Object recognition method and object recognition device202412,074,071Source/drain structures and method of forming202411,923,409Epitaxial structures exposed in airgaps for semiconductor devices202411,804,408Semiconductor device and method202311,677,013Source/drain epitaxial layers for transistors202311,600,534Source/drain structures and method of forming202311,532,750Semiconductor device and method of manufacture202211,527,650FinFET device having a source/drain region with a multi-sloped undersurface202211,348,840Semiconductor device and method202211,185,386Smart marking system for surgical video and method thereof2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021Patents assigned to UNIV TAIPEI MEDICAL (1)· patent assignee history
2021–2026Based in TW· patent location history
2022–2026Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (18)· patent assignee history
2024Patents assigned to RICHWAVE TECHNOLOGY CORP (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG CO LTD | 18 | 2022–2026 |
| RICHWAVE TECHNOLOGY CORP | 1 | 2024 |
| UNIV TAIPEI MEDICAL | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| TW | 20 | 2021–2026 |