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Inventor

Taide Tan

Inventor
Tigard, OR, US

Overview

2→
Patents
2019–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B05Cprimary
B05CApparatus for applying fluent materials to surfaces, in general14%
C23CCoating metallic material14%
G06FElectric digital data processing14%
H01JElectric discharge tubes or discharge lamps14%
H01LSemiconductor devices14%
H04MTelephonic communication14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
PatentTitleYear
11,101,164Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition202110,345,867Shaft structure and electronic apparatus2019

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2019Patents assigned to LENOVO BEIJING CO LTD (1)· patent assignee history
2019Based in Beijing, CN· patent location history
2021Patents assigned to LAM RES CORP (1)· patent assignee history
2021Based in Tigard, OR, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
LAM RES CORP12021
LENOVO BEIJING CO LTD12019
Locations
LocationPatentsSpan
Tigard, OR, US12021
Beijing, CN12019