LexDanaLexDanabeta
Inventor

Norio Akutsu

Inventor
Tokyo, JP

Overview

3→
Patents
1981–2005
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
H02KDynamo-electric machines17%
Y10TTechnical subjects covered by former us classification17%
PatentTitleYear
6,927,165'Method and apparatus for processing substrates and method for manufacturing a semiconductor device'20056,638,860'Method and apparatus for processing substrates and method for manufacturing a semiconductor device'20034,299,023'Machine for winding and inserting coils'1981

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1981Patents assigned to HITACHI LTD (1)· patent assignee history
1981Based in Hitachi, JP· patent location history
2003–2005Patents assigned to HITACHI INT ELECTRIC INC (2)· patent assignee history
2003–2005Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HITACHI INT ELECTRIC INC22003–2005
HITACHI LTD11981
Locations
LocationPatentsSpan
Tokyo, JP22003–2005
Hitachi, JP11981