Inventor
Patrick Willem Paul Limpens
Inventor
Eindhoven, NL
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Rprimary
G01RMeasuring electric variables57%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices29%
H02KDynamo-electric machines14%
PatentTitleYear
10,747,127Lithographic apparatus202010,620,552Stage system, lithographic apparatus and device manufacturing method20207,400,146'Magnetic resonance imaging apparatus with reduced noise production'20087,193,416'Open magnetic resonance imaging (MRI) magnet system'20077,053,616'MRI system having a gradient magnet system with a balance member'20066,998,949'Magnetic resonance imaging (MRI) system comprising acoustic resonators'2006Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2006–2008Patents assigned to KONINKL PHILIPS ELECTRONICS NV (4)· patent assignee history
2006–2008Based in Eindhoven, NL· patent location history
2020Patents assigned to ASML NETHERLANDS BV (2)· patent assignee history
2020Based in Uden, NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KONINKL PHILIPS ELECTRONICS NV | 4 | 2006–2008 |
| ASML NETHERLANDS BV | 2 | 2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Eindhoven, NL | 4 | 2006–2008 |
| Uden, NL | 2 | 2020 |