Inventor

Hidetami Yaegashi

Inventor

Tokyo, JP

Overview

1996–2020

Patent span

Electricity

Primary field (CPC H)

Patents· 37 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1036%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices24%

H01LSemiconductor devices12%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%

B08BCleaning in general3%

G03DApparatus for processing exposed photographic materials2%

H10BElectronic memory devices2%

B05CApparatus for applying fluent materials to surfaces, in general1%

B05DProcesses for applying fluent materials to surfaces, in general1%

PatentTitleYear

10,741,444Method of forming film2020 10,573,530Pattern forming method2020 10,539,876Pattern forming method2020 10,366,888Pattern forming method2019 10,317,797Pattern forming method for forming a pattern2019 10,211,050Method for photo-lithographic processing in semiconductor device manufacturing2019 10,074,557Pattern forming method2018 9,818,612'Method for manufacturing semiconductor device'2017 9,690,185'Substrate processing method, program, computer-readable storage medium, and substrate processing system'2017 9,679,770'Semiconductor device manufacturing method and semiconductor device manufacturing apparatus'2017 9,653,293'Semiconductor device manufacturing method and semiconductor device manufacturing apparatus'2017 9,459,535'Method of forming pattern'2016 9,418,860'Use of topography to direct assembly of block copolymers in grapho-epitaxial applications'2016 9,023,225'Pattern forming method'2015 8,551,691'Method of forming mask pattern'2013 8,415,092'Substrate developing method, substrate processing method and developing solution supply nozzle'2013 8,283,253'Pattern forming method, semiconductor device manufacturing method and semiconductor device manufacturing apparatus'2012 8,273,661'Pattern forming method, semiconductor device manufacturing method and semiconductor device manufacturing apparatus'2012 8,263,320'Method, program and system for processing substrate'2012 7,846,648'Substrate developing method, substrate processing method and developing solution supply nozzle'2010 7,367,710'Developing solution supply nozzle with stirrer'2008 6,884,298'Method and system for coating and developing'2005 6,565,928'Film forming method and film forming apparatus'2003 6,518,199'Method and system for coating and developing'2003 6,287,023'Processing apparatus and method'2001 6,284,044'Film forming method and film forming apparatus'2001 6,097,469'Method of processing resist onto substrate and resist processing apparatus'2000 6,054,181'Method of substrate processing to form a film on multiple target objects'2000 6,017,663'Method of processing resist utilizing alkaline component monitoring'2000 5,964,954'Double-sided substrate cleaning apparatus and cleaning method using the same'1999 5,932,380'Method of processing resist utilizing alkaline component monitoring'1999 5,928,390'Vertical processing apparatus'1999 5,876,280'Substrate treating system and substrate treating method'1999 5,725,664'Semiconductor wafer processing apparatus including localized humidification between coating and heat treatment sections'1998 5,686,143'Resist treating method'1997 5,565,034'Apparatus for processing substrates having a film formed on a surface of the substrate'1996 5,518,542'Double-sided substrate cleaning apparatus'1996

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1996–2020Patents assigned to TOKYO ELECTRON LTD (37)· patent assignee history

1996–2000Patents assigned to TEL KYUSHU KK (6)· patent assignee history

1996–2020Based in Tokyo, JP· patent location history

1996–2016Based in Kokubunji, JP· patent location history

2003Based in Minato-ku, JP· patent location history

2012–2013Patents assigned to YAEGASHI HIDETAMI (5)· patent assignee history

2012Patents assigned to SHIMURA SATORU (2)· patent assignee history

2012Based in Yamanashi, JP· patent location history

2012Based in Nirasaki, JP· patent location history

2016–2019Patents assigned to TOKYO OHKA KOGYO CO LTD (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
TOKYO ELECTRON LTD	37	1996–2020
TEL KYUSHU KK	6	1996–2000
YAEGASHI HIDETAMIself	5	2012–2013
TOKYO OHKA KOGYO CO LTD	3	2016–2019
SHIMURA SATORU	2	2012

Locations

Location	Patents	Span
Tokyo, JP	21	1996–2020
Kokubunji, JP	12	1996–2016
Yamanashi, JP	2	2012
Nirasaki, JP	1	2012
Minato-ku, JP	1	2003