Inventor
Erwin John Van Zwet
Inventor
Pijnacker, NL
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices39%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1028%
G02BOptical elements, systems or apparatus8%
H01LSemiconductor devices6%
Y10TTechnical subjects covered by former us classification6%
B25JManipulators3%
C23CCoating metallic material3%
G05BControl or regulating systems in general3%
H01JElectric discharge tubes or discharge lamps3%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light3%
PatentTitleYear
10,761,315High power adaptive mirror202010,712,674Method of determining an overlay error, manufacturing method and system for manufacturing of a multilayer semiconductor device, and semiconductor device manufactured thereby202010,224,685Multi-beam laser system201910,114,289Exposure head, exposure apparatus and method of operating an exposure head201810,014,165Radiation sensor device for high energy photons20189,715,183'Device, lithographic apparatus, method for guiding radiation and device manufacturing method'20179,482,963'Method of controlling a patterning device in a lithographic apparatus, device manufacturing method and lithographic apparatus'20169,416,449'Continuous patterned layer deposition'20169,372,412'Lithographic apparatus and device manufacturing method'20169,335,638'Lithographic apparatus, programmable patterning device and lithographic method'20169,316,926'Lithographic apparatus and device manufacturing method'20169,235,140'Lithographic apparatus and device manufacturing method'20169,134,630'Lithographic apparatus and device manufacturing method'20159,041,911'Lithographic apparatus and device manufacturing method'20158,925,186'System and method for picking and placement of chip dies'20158,717,535'SLM calibration'20148,531,648'Lithographic apparatus, programmable patterning device and lithographic method'20137,245,357'Lithographic apparatus and device manufacturing method'2007Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2007–2017Patents assigned to ASML NETHERLANDS BV (11)· patent assignee history
2007Based in Delfgauw, NL· patent location history
2013–2016Patents assigned to VAN ZWET ERWIN JOHN (9)· patent assignee history
2013–2016Patents assigned to DE JAGER PIETER WILLEM HERMAN (6)· patent assignee history
2013–2016Patents assigned to ONVLEE JOHANNES (5)· patent assignee history
2013–2017Based in Pijnacker, NL· patent location history
2015–2020Patents assigned to TNO (6)· patent assignee history
2018–2020Based in 's-Hertogenbosch, NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 11 | 2007–2017 |
| VAN ZWET ERWIN JOHNself | 9 | 2013–2016 |
| DE JAGER PIETER WILLEM HERMAN | 6 | 2013–2016 |
| TNO | 6 | 2015–2020 |
| ONVLEE JOHANNES | 5 | 2013–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Pijnacker, NL | 12 | 2013–2017 |
| 's-Hertogenbosch, NL | 5 | 2018–2020 |
| Delfgauw, NL | 1 | 2007 |