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Inventor

Sven Heisig

Inventor
Leipzig, DE

Overview

1→
Patents
2020
Patent span
Physics
Primary field (CPC G)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
G06TImage data processing or generation, in general25%
H01LSemiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
PatentTitleYear
10,572,990Pattern inspection apparatus, pattern position measurement apparatus, aerial image measurement system, method for measuring aerial image, pattern position repairing apparatus, method for repairing pattern position, aerial image data processing apparatus, method for processing aerial image data, pattern exposure apparatus, method for exposing pattern, method for manufacturing mask, and mask manufacturing system2020

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2020Patents assigned to NUFLARE TECHNOLOGY INC (1)· patent assignee history
2020Based in Leipzig, DE· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NUFLARE TECHNOLOGY INC12020
Locations
LocationPatentsSpan
Leipzig, DE12020