Inventor
George W. Orsula
Inventor
Avon, MA, US
Overview
Patents· 21 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices64%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests36%
PatentTitleYear
7,776,508'Antihalation compositions'20107,704,668'Photoresist compositions and methods and articles of manufacture comprising same'20107,378,222'Antihalation compositions'20087,014,982'Antihalation compositions'20066,803,169'Photoresist compositions comprising blends of photoacid generators'20046,773,864'Antihalation compositions'20046,528,235'Antihalation compositions'20036,472,128'Antihalation compositions'20026,451,503'Antihalation compositions'20026,203,965'Photoresist comprising blends of photoacid generators'20016,200,728'Photoresist compositions comprising blends of photoacid generators'20016,165,697'Antihalation compositions'20005,919,597'Methods for preparing photoresist compositions'19995,851,738'Method comprising substrates coated with an antihalation layer that contains a resin binder comprising anthracene units'19985,851,730'Substrates coated with an antihalation layer that contains a resin binder comprising anthracene units'19985,541,263'Polymer having inert blocking groups'19965,514,520'Radiation sensitive composition comprising polymer having inert blocking groups'19965,368,993'Method of forming relief image having line width less than 0.35 microns utilizing copolymer binder having phenolic and nonaromatic cyclic alcohol units'19945,340,696'Photoresist compositions with copolymer binder having phenolic and nonaromatic cyclic alcohol units where the distribution of the cyclic alcohol concentration is less than 8 mole percent'19945,210,000'Photoresist and method for forming a relief image utilizing composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units'19935,128,232'Photoresist composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units'1992Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1992–1996Based in Tewksbury, MA, US· patent location history
1993–1994Patents assigned to SHIPLEY CO (3)· patent assignee history
1996–2010Patents assigned to SHIPLEY CO LLC (15)· patent assignee history
1998–2010Based in Avon, MA, US· patent location history
1999Patents assigned to IBM CORP OF ARMONK (1)· patent assignee history
1999–2010Based in Harvard, MA, US· patent location history
2001Patents assigned to IBM (1)· patent assignee history
2010Patents assigned to ROHM & HAAS ELECT MAT (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHIPLEY CO LLC | 15 | 1996–2010 |
| SHIPLEY CO | 3 | 1993–1994 |
| IBM | 1 | 2001 |
| IBM CORP OF ARMONK | 1 | 1999 |
| ROHM & HAAS ELECT MAT | 1 | 2010 |
Locations
| Location | Patents | Span |
|---|---|---|
| Avon, Massachusetts, US | 10 | 1998–2010 |
| Tewksbury, Massachusetts, US | 6 | 1992–1996 |
| Harvard, Massachusetts, US | 5 | 1999–2010 |