Inventor

Tatsuo Ohtani

Inventor
Fukushima, JP

Overview

14→
Patents
1994–2018
Patent span
Performing operations
Primary field (CPC B)

Patents· 14 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B24Bprimary
B24BMachines, devices, or processes for grinding or polishing42%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds12%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
A61KPreparations for medical, dental or toiletry purposes4%
A61QSpecific use of cosmetics or similar toiletry preparations4%
B23QDetails, components, or accessories for machine tools, e.g. arrangements for copying or controlling4%
B24DTools for grinding, buffing or sharpening4%
C08LCompositions of macromolecular compounds4%
C09DCoating compositions, e.g. paints, varnishes or lacquers4%
C10MLubricating compositions4%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1994–2001Patents assigned to SHINETSU HANDOTAI KK (9)· patent assignee history
1994–2001Based in Fukushima, JP· patent location history
1995–1998Patents assigned to FUJIKOSHI MACHINERY CORP (4)· patent assignee history
1995–1998Based in Nishishirakawa, JP· patent location history
2017–2018Patents assigned to OHTANI TATSUO (3)· patent assignee history
2017–2018Patents assigned to OZAWA HITOSHI (3)· patent assignee history
2017–2018Patents assigned to SUMITOMO SEIKA CHEMICALS (3)· patent assignee history
2017–2018Based in Himeji, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SHINETSU HANDOTAI KK91994–2001
FUJIKOSHI MACHINERY CORP41995–1998
OHTANI TATSUOself32017–2018
OZAWA HITOSHI32017–2018
SUMITOMO SEIKA CHEMICALS32017–2018
Locations
LocationPatentsSpan
Fukushima, JP91994–2001
Himeji, JP32017–2018
Nishishirakawa, JP21995–1998