Inventor
Vincent J. Carlos
Inventor
Essex Junction, VT, US
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices67%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
PatentTitleYear
7,060,626'Multi-run selective pattern and etch wafer process'20066,944,578'Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus'20056,917,901'Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005–2006Patents assigned to IBM (3)· patent assignee history
2005Based in Essex Junction, VT, US· patent location history
2006Based in Essex, VT, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 3 | 2005–2006 |
Locations
| Location | Patents | Span |
|---|---|---|
| Essex Junction, VT, US | 2 | 2005 |
| Essex, VT, US | 1 | 2006 |