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Inventor

Kouzo Tsukada

Inventor
Yokohama-shi, JP

Overview

3→
Patents
1993–1999
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
B08BCleaning in general17%
G05DSystems for controlling or regulating non-electric variables17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
PatentTitleYear
5,896,874'Apparatus for controlling resist stripping solution'19995,671,760'Apparatus for controlling resist stripping solution'19975,223,881'Apparatus for controlling developing solution'1993

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1993–1999Patents assigned to NAGASE & CO LTD (3)· patent assignee history
1993Patents assigned to HIRAMA RIKA KENKYUJIO LTD (1)· patent assignee history
1993–1997Based in Yokohama-shi, JP· patent location history
1997–1999Patents assigned to HIRAMA RIKA KENKYUJO LTD (2)· patent assignee history
1999Based in Yokohama, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NAGASE & CO LTD31993–1999
HIRAMA RIKA KENKYUJO LTD21997–1999
HIRAMA RIKA KENKYUJIO LTD11993
Locations
LocationPatentsSpan
Yokohama-shi, JP21993–1997
Yokohama, JP11999