Inventor
SOON MOK HA
Inventor
KR
Overview
Patents· 1 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
H01LSemiconductor devices33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
PatentTitleYear
11,474,426Photomask for negative-tone development2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022Patents assigned to SAMSUNG ELECTRONICS CO LTD (1)· patent assignee history
2022Based in KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 1 | 2022 |
Locations
| Location | Patents | Span |
|---|---|---|
| KR | 1 | 2022 |