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Inventor

Edwina Lai

Inventor
Hsinchu, TW

Overview

2→
Patents
2018–2021
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

A61Bprimary
A61BDiagnosis17%
B01LChemical or physical laboratory apparatus for general use17%
G01PMeasuring linear or angular speed, acceleration, deceleration, or shock17%
G02BOptical elements, systems or apparatus17%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices17%
H05GX-ray technique17%
PatentTitleYear
11,029,324Particle image velocimetry of extreme ultraviolet lithography systems20219,908,113'Methods and devices for sample collection and sample separation'2018

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2018Patents assigned to THERANOS INC (1)· patent assignee history
2018Patents assigned to THERANOS IP CO LLC (1)· patent assignee history
2018Based in Palo Alto, CA, US· patent location history
2021Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (1)· patent assignee history
2021Based in Hsinchu, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG CO LTD12021
THERANOS INC12018
THERANOS IP CO LLC12018
Locations
LocationPatentsSpan
Hsinchu, TW12021
Palo Alto, California, US12018