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Inventor

Noriyasu Fukushima

Inventor
Niigata, JP

Overview

9→
Patents
1987–2010
Patent span
Physics
Primary field (CPC G)

Patents· 9 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices30%
C23CCoating metallic material20%
Y10TTechnical subjects covered by former us classification15%
A01KAnimal husbandry10%
B60QArrangement of signalling or lighting devices, the mounting or supporting thereof or circuits therefor, for vehicles in general10%
B62DMotor vehicles10%
LOC225%
PatentTitleYear
7,767,368'Method of fabricating photomask blank'20107,736,824'Photomask blank, photomask, and method of manufacture'20107,632,609'Fabrication method of photomask-blank'20097,514,185'Preparation of photomask blank and photomask'20097,344,806'Method of producing phase shift mask blank, method of producing phase shift mask, phase shift mask blank, and phase shift mask'20087,329,474'Photomask blank, photomask, and method of manufacture'2008D0467299'Fishing reel body'20024,848,022'Handle for a fishing rod'19894,674,699'Backlash preventing device for fishing reel'1987

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1987–2002Patents assigned to DAIWA SEIKO INC (3)· patent assignee history
1987Based in Tokyo, JP· patent location history
1989Based in Saitama, JP· patent location history
2002Based in Higashikurume, JP· patent location history
2008–2010Patents assigned to SHINETSU CHEMICAL CO (4)· patent assignee history
2008–2009Patents assigned to SHIN ESTU CHEMICAL CO LTD (2)· patent assignee history
2008–2010Based in Niigata, JP· patent location history
2009Based in Joetsu-shi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SHINETSU CHEMICAL CO42008–2010
DAIWA SEIKO INC31987–2002
SHIN ESTU CHEMICAL CO LTD22008–2009
Locations
LocationPatentsSpan
Niigata, JP52008–2010
Joetsu-shi, JP12009
Higashikurume, JP12002
Saitama, JP11989
Tokyo, JP11987