Inventor
Satoshi Ebata
Inventor
Tokyo, JP
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C07Dprimary
C07DHeterocyclic compounds16%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices16%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests16%
C07CAcyclic or carbocyclic compounds11%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium11%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds11%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients5%
C23CCoating metallic material5%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%
Y10TTechnical subjects covered by former us classification5%
PatentTitleYear
8,043,786'Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions'20117,371,503'Sulfonium salt compound, photoacid generator, and positive-tone radiation-sensitive resin composition'20087,268,196'Process for producing cycloolefin addition polymer'20077,241,847'Process for producing cycloolefin addition polymer'20076,908,722'Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition'20056,875,518'Ruthenium film, ruthenium oxide film and process for forming the same'20056,503,570'Cyclosilane compound, and solution composition and process for forming a silicon film'2003Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2003–2011Patents assigned to JSR CORP (7)· patent assignee history
2003–2011Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| JSR CORP | 7 | 2003–2011 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 7 | 2003–2011 |