Inventor
ABHILASH J. MAYUR
Inventor
US
Overview
Patents· 10 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices26%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
H10BElectronic memory devices11%
C23CCoating metallic material9%
H01JElectric discharge tubes or discharge lamps6%
B23KSoldering or unsoldering3%
F27BFurnaces, kilns, ovens or retorts in general3%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light3%
G05BControl or regulating systems in general3%
G05DSystems for controlling or regulating non-electric variables3%
PatentTitleYear
12,347,679System and method for radical and thermal processing of substrates202512,327,763Treatment methods for titanium nitride films202512,085,965Systems, methods, and apparatus for correcting thermal processing of substrates202411,978,646Thermal chamber with improved thermal uniformity202411,945,045Annealing apparatus using two wavelengths of radiation202411,823,901System and method for radical and thermal processing of substrates202311,587,789System and method for radical and thermal processing of substrates202311,492,698Optically transparent pedestal for fluidly supporting a substrate202211,469,100Methods of post treating dielectric films with microwave radiation2022D0959490Display screen or portion thereof with graphical user interface2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to APPLIED MATERIALS INC (10)· patent assignee history
2022–2025Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 10 | 2022–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 10 | 2022–2025 |