Inventor
Maurits Van Der Schaar
Inventor
Eindhoven, NL
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
G01NInvestigating or analysing materials by determining their chemical or physical properties33%
G01RMeasuring electric variables8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
PatentTitleYear
11,125,806Metrology apparatus and method for determining a characteristic of one or more structures on a substrate202111,126,093Focus and overlay improvement by modifying a patterning device202111,092,900Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method202111,003,099Method and apparatus for design of a metrology target202110,996,570Metrology method, patterning device, apparatus and computer program202110,955,353Method and apparatus for angular-resolved spectroscopic lithography characterization2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021Patents assigned to ASML NETHERLANDS BV (6)· patent assignee history
2021Based in Eindhoven, NL· patent location history
2021Based in Veldhoven, NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 6 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Eindhoven, NL | 5 | 2021 |
| Veldhoven, NL | 1 | 2021 |