Inventor

James A. Fair

Inventor

Mountain View, CA, US

Overview

21→

Patents

1986–2014

Patent span

Chemistry

Primary field (CPC C)

Patents· 21 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary

C23CCoating metallic material41%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1018%

C30BSingle-crystal growth5%

C23GCleaning or de-greasing of metallic material by chemical methods other than electrolysis3%

G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light3%

H01JElectric discharge tubes or discharge lamps3%

H10BElectronic memory devices3%

H10DInorganic electric semiconductor devices3%

PatentTitleYear

8,864,935'Plasma generator apparatus'2014 7,897,215'Sequential UV induced chemical vapor deposition'2011 7,691,749'Deposition of tungsten nitride'2010 7,176,140'Adhesion promotion for etch by-products'2007 7,157,798'Selective refractory metal and nitride capping'2007 7,144,806'ALD of tantalum using a hydride reducing agent'2006 7,107,998'Method for preventing and cleaning ruthenium-containing deposits in a CVD apparatus'2006 7,014,709'Thin layer metal chemical vapor deposition'2006 7,005,372'Deposition of tungsten nitride'2006 6,905,543'Methods of forming tungsten nucleation layer'2005 6,849,122'Thin layer metal chemical vapor deposition'2005 6,844,258'Selective refractory metal and nitride capping'2005 6,720,260'Sequential electron induced chemical vapor deposition'2004 6,627,268'Sequential ion, UV, and electron induced chemical vapor deposition'2003 6,464,779'Copper atomic layer chemical vapor desposition'2002 6,010,748'Method of delivering source reagent vapor mixtures for chemical vapor deposition using interiorly partitioned injector'2000 5,751,019'Method and structure for reducing short circuits between overlapping conductors'1998 5,741,363'Interiorly partitioned vapor injector for delivery of source reagent vapor mixtures for chemical vapor deposition'1998 5,208,643'Method of and apparatus for non-contact temperature measurement'1993 4,920,908'Method and apparatus for deposition of tungsten silicides'1990 4,565,157'Method and apparatus for deposition of tungsten silicides'1986

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1986–1990Patents assigned to GENUS INC (2)· patent assignee history

1986–2014Based in Mountain View, CA, US· patent location history

1993–1998Patents assigned to VARIAN ASSOCIATES (2)· patent assignee history

1998–2000Patents assigned to ADVANCED TECH MATERIALS (2)· patent assignee history

1998–2000Patents assigned to IBM (2)· patent assignee history

2002–2014Patents assigned to NOVELLUS SYSTEMS INC (15)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
NOVELLUS SYSTEMS INC	15	2002–2014
ADVANCED TECH MATERIALS	2	1998–2000
GENUS INC	2	1986–1990
IBM	2	1998–2000
VARIAN ASSOCIATES	2	1993–1998

Locations

Location	Patents	Span
Mountain View, California, US	21	1986–2014