Inventor
Richard E. Demaray
Inventor
Portola Valley, CA, US
Overview
Patents· 49 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material31%
H01JElectric discharge tubes or discharge lamps16%
G02BOptical elements, systems or apparatus10%
Y10TTechnical subjects covered by former us classification9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%
Y02PClimate change mitigation technologies in the production or processing of goods5%
F28FDetails of heat-exchange and heat-transfer apparatus, of general application4%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution3%
H01MProcesses or means, e.g. batteries, for the direct conversion of chemical energy into electrical energy3%
C09KMaterials for miscellaneous applications, not provided for elsewhere1%
PatentTitleYear
10,818,909Energy storage device with a first metal layer formed from a precursor layer upon charge and diffused into a cathode during discharge202010,120,130Adiabatic planar waveguide coupler transformer20189,989,701Adiabatic planar waveguide coupler transformer20189,887,414'Deposition of LiCoO2'20189,798,082'Adiabatic planar waveguide coupler transformer'20179,366,816'Adiabatic planar waveguide coupler transformer'20168,728,285'Transparent conductive oxides'20148,636,876'Deposition of LiCoO2'20148,173,482'Devices and methods of protecting a cadmium sulfide for further processing'20128,105,466'Biased pulse DC reactive sputtering of oxide films'20128,076,005'Energy conversion and storage films and devices by physical vapor deposition of titanium and titanium oxides and sub-oxides'20118,045,832'Mode size converter for a planar waveguide'20117,959,769'Deposition of LiCoO2'20117,838,133'Deposition of perovskite and other compound ceramic films for dielectric applications'20107,544,276'Biased pulse DC reactive sputtering of oxide films'20097,469,558'As-deposited planar optical waveguides with low scattering loss and methods for their manufacture'20087,413,998'Biased pulse DC reactive sputtering of oxide films'20087,404,877'Low temperature zirconia based thermal barrier layer by PVD'20087,381,657'Biased pulse DC reactive sputtering of oxide films'20087,378,356'Biased pulse DC reactive sputtering of oxide films'20087,262,131'Dielectric barrier layer films'20077,238,628'Energy conversion and storage films and devices by physical vapor deposition of titanium and titanium oxides and sub-oxides'20077,205,662'Dielectric barrier layer films'20076,884,327'Mode size converter for a planar waveguide'20056,827,826'Planar optical devices and methods for their manufacture'20046,821,562'Method of forming an electrically insulating sealing structure for use in a semiconductor manufacturing apparatus'20046,773,562'Shadow frame for substrate processing'20046,533,907'Method of producing amorphous silicon for hard mask and waveguide applications'20036,506,289'Planar optical devices and methods for their manufacture'20036,436,509'Electrically insulating sealing structure and its method of use in a semiconductor manufacturing apparatus'20026,362,097'Collimated sputtering of semiconductor and other films'20026,257,045'Automated substrate processing systems and methods'20016,205,870'Automated substrate processing systems and methods'20016,199,259'Autoclave bonding of sputtering target assembly'20016,033,483'Electrically insulating sealing structure and its method of use in a high vacuum physical vapor deposition apparatus'20005,855,744'Non-planar magnet tracking during magnetron sputtering'19995,799,860'Preparation and bonding of workpieces to form sputtering targets and other assemblies'19985,676,803'Sputtering device'19975,635,036'Collimated deposition apparatus and method'19975,603,816'Sputtering device and target with cover to hold cooling fluid'19975,595,337'Sputtering device and target with cover to hold cooling fluid'19975,565,071'Integrated sputtering target assembly'19965,518,593'Shield configuration for vacuum chamber'19965,487,822'Integrated sputtering target assembly'19965,433,835'Sputtering device and target with cover to hold cooling fluid'19955,330,628'Collimated deposition apparatus and method'19945,252,194'Rotating sputtering apparatus for selected erosion'19934,834,860'Magnetron sputtering targets'19894,676,994'Adherent ceramic coatings'1987Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1987–1997Based in Oakland, CA, US· patent location history
1989Based in Hercules, CA, US· patent location history
1995–2004Patents assigned to APPLIED MATERIALS INC (10)· patent assignee history
1995–2020Based in Portola Valley, CA, US· patent location history
1996–2001Patents assigned to APPLIED KOMATSU TECHNOLOGY INC (5)· patent assignee history
2003–2007Patents assigned to SYMMORPHIX INC (6)· patent assignee history
2008–2012Patents assigned to SPRINGWORKS LLC (10)· patent assignee history
2014–2020Patents assigned to DEMARAY LLC (7)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 10 | 1995–2004 |
| SPRINGWORKS LLC | 10 | 2008–2012 |
| DEMARAY LLC | 7 | 2014–2020 |
| SYMMORPHIX INC | 6 | 2003–2007 |
| APPLIED KOMATSU TECHNOLOGY INC | 5 | 1996–2001 |
Locations
| Location | Patents | Span |
|---|---|---|
| Portola Valley, California, US | 44 | 1995–2020 |
| Oakland, California, US | 4 | 1987–1997 |
| Hercules, California, US | 1 | 1989 |