Inventor
Jeong Kweon Park
Inventor
Paju-si, KR
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G02Fprimary
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
B05CApparatus for applying fluent materials to surfaces, in general11%
B05BSpraying apparatus8%
H01LSemiconductor devices6%
B23KSoldering or unsoldering5%
B24BMachines, devices, or processes for grinding or polishing5%
H10DInorganic electric semiconductor devices5%
B26FPerforating3%
C03BManufacture, shaping, or supplementary processes3%
PatentTitleYear
10,825,837Substrate processing apparatus and display device using the same202010,748,771Apparatus for processing a substrate and display device by using the same202010,700,047Panel with a notch accommodating a component, display apparatus including the same, and method of manufacturing the same202010,276,383Apparatus for processing a substrate and display device by using the same20198,303,786'Sputtering apparatus'20128,173,930'Apparatus for cutting substrate'20128,128,995'Method of fabricating liquid crystal display panel for coating liquid on substrate'20128,053,021'Coating apparatus and operating method thereof'20117,914,843'Slit coater having pre-applying unit and coating method using the same'20117,767,555'Method for cutting substrate using femtosecond laser'20107,647,884'Slit coater with a standby unit for a nozzle and a coating method using the same'20107,638,729'Apparatus for cutting substrate and method using the same'20097,608,150'Coating apparatus and operating method thereof'20097,491,557'Thin film etching method and method of fabricating liquid crystal display device using the same'20097,452,422'Apparatus for coating photoresist having slit nozzle'20087,416,758'Slit coater'20087,279,044'Apparatus and method of fabricating liquid crystal display panel'20076,764,944'Method for forming metal wire interconnection in semiconductor devices using dual damascene process'20046,528,216'Phase shift mask and fabrication method thereof'20036,432,766'Method of fabricating a SRAM device'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2003Patents assigned to HYNIX SEMICONDUCTOR INC (2)· patent assignee history
2004Patents assigned to HYUNDAI ELECTRONICS IND (1)· patent assignee history
2007–2012Based in Kumi-shi, KR· patent location history
2008–2020Patents assigned to LG DISPLAY CO LTD (16)· patent assignee history
2008–2012Based in Gyeongsangbuk-do, KR· patent location history
2009–2011Based in Gumi-si, KR· patent location history
2009–2012Based in Gumi-city, KR· patent location history
2012Patents assigned to PARK JEONG KWEON (2)· patent assignee history
2012Patents assigned to KIM SUNG-EUN (1)· patent assignee history
2019–2020Based in Paju-si, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LG DISPLAY CO LTD | 16 | 2008–2020 |
| HYNIX SEMICONDUCTOR INC | 2 | 2002–2003 |
| PARK JEONG KWEONself | 2 | 2012 |
| HYUNDAI ELECTRONICS IND | 1 | 2004 |
| KIM SUNG-EUN | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Paju-si, KR | 4 | 2019–2020 |
| Gyeongsangbuk-do, KR | 4 | 2008–2012 |
| Gumi-si, KR | 4 | 2009–2011 |
| Gumi-city, KR | 3 | 2009–2012 |
| Kumi-shi, KR | 2 | 2007–2012 |