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Inventor

Koshiro Ochiai

Inventor
Toyonaka, JP

Overview

5→
Patents
2000–2006
Patent span
Chemistry
Primary field (CPC C)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests33%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds17%
C07CAcyclic or carbocyclic compounds8%
C07DHeterocyclic compounds8%
PatentTitleYear
7,144,674'Positive resist composition'20066,777,511'Process for producing poly (meth) acrylates having reduced metal content'20046,762,007'Chemical amplification type positive resist composition'20046,258,507'Photoresist compositions'20016,153,349'Photo resist composition'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2006Patents assigned to SUMITOMO CHEMICAL CO (5)· patent assignee history
2000–2006Based in Toyonaka, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SUMITOMO CHEMICAL CO52000–2006
Locations
LocationPatentsSpan
Toyonaka, JP52000–2006