Inventor

Heiji Tanaka

Inventor

Hiroshima, JP

Overview

2000

Patent span

Performing operations

Primary field (CPC B)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B01Dprimary

B01DSeparation33%

B01JChemical or physical processes, e.g. catalysis or colloid chemistry33%

B05BSpraying apparatus33%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2000Patents assigned to MITSUBISHI HEAVY IND LTD (1)· patent assignee history

2000Based in Hiroshima, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
MITSUBISHI HEAVY IND LTD	1	2000

Locations

Location	Patents	Span
Hiroshima, JP	1	2000