LexDanaLexDanabeta
Inventor

Shinji Sato

Inventor
Fukaya, JP

Overview

131→
Patents
1979–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 131 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices16%
G11CStatic stores9%
H10DInorganic electric semiconductor devices7%
H01LSemiconductor devices4%
H02MApparatus for conversion between ac and ac, between ac and dc, or between dc and dc, and for use with mains or similar power supply systems4%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h103%
B82YSpecific uses or applications of nanostructures3%
H10BElectronic memory devices3%
H03KPulse technique2%
PatentTitleYear
10,988,549Method for producing cellulose nanofiber dry solid202110,850,218Filtration method and production process of cellulose nanofiber dispersion202010,829,840Steel sheet for hot pressing and hot pressed article using the same202010,768,537Liquid immersion exposure apparatus202010,739,683Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium202010,678,141Exposure apparatus, exposing method, method for manufacturing device, program, and recording medium202010,599,050Exposure apparatus, exposing method, method for manufacturing device, program, and recording medium202010,549,962Upper body of mobile crane202010,533,060Anion-modified cellulose nanofiber dispersion liquid and composition202010,525,931Webbing take-up device202010,472,213Lattice boom201910,461,050Bonding pad structure of a semiconductor device201910,444,634Exposure apparatus, exposing method, method for manufacturing device, program, and recording medium201910,423,080Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium201910,416,449Display apparatus having moving mechanism201910,409,177Liquid immersion exposure apparatus201910,354,734Memory device including multiple gate-induced drain leakage current generator circuits201910,133,189Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium201810,095,127Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium201810,082,738Liquid immersion member, exposure apparatus, exposure method, and method of manufacturing device201810,020,282Method for manufacturing semiconductor device, heat insulating load jig, and method for setting up heat insulating load jig201810,007,189Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium20189,981,630Webbing take-up device20189,927,724'Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium'20189,915,882'Exposure apparatus, exposing method, method for manufacturing device, program, and recording medium'20189,916,901'Memory device including multiple gate-induced drain leakage current generator circuits'20189,910,365'Exposure apparatus, exposing method, device manufacturing method, program, and recording medium'20189,904,184'Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium'20189,857,700'Exposure apparatus, exposing method, method for manufacturing device, program, and recording medium'20189,823,582'Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium'20179,823,580'Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium'20179,823,583'Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium'20179,772,443'Lighting plastic optical fiber and method of manufacturing same'20179,732,538'Laminated sliding member and sliding bearing using the laminated sliding member'20179,720,331'Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium'20179,698,082'Au-based solder die attachment semiconductor device and method for manufacturing the same'20179,651,873'Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium'20179,637,096'Vehicle control apparatus'20179,612,538'Exposure apparatus, exposure method, and device manufacturing method'20179,568,828'Exposure apparatus, exposing method, device manufacturing method, program, and recording medium'20179,557,654'Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium'20179,507,265'Exposure apparatus, exposing method, method for manufacturing device, program, and recording medium'20169,494,876'Exposure apparatus, exposure method, method of manufacturing device, program, and storage medium'20169,494,870'Exposure apparatus, exposing method, device manufacturing method, program, and recording medium'2016D0762891'Lamp for vehicle'20169,329,496'Exposure apparatus, exposure method, method of manufacturing device, program, and storage medium'2016RE045954'Non-volatile storage with temperature compensation based on neighbor state information'20169,290,670'Conductive metallic coating material, method of corrosion prevention with conductive metallic coating material, and method of corrosion-preventive repair therewith'20169,268,231'Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium'2016RE045871'Selected word line dependent select gate voltage during program'20169,224,457'Non-volatile storage with temperature compensation based on neighbor state information'20159,190,232'Tank-type circuit breaker'20159,182,447'Tank-type switching device'2015D0736440'Combination lamp for an automobile'2015D0735918'Combination lamp for an automobile'20159,087,601'Select gate bias during program of non-volatile storage'20159,036,438'Non-volatile storage with temperature compensation based on neighbor state information'20158,975,182'Method for manufacturing semiconductor device, and semiconductor device'20158,953,143'Liquid immersion member'20158,937,703'Liquid immersion member, immersion exposure apparatus, liquid recovering method, device fabricating method, program, and storage medium'20158,921,998'Semiconductor module'20148,916,882'Switching circuit and semiconductor module'20148,896,806'Exposure apparatus, exposure method, and device manufacturing method'20148,885,404'Non-volatile storage system with three layer floating gate'20148,804,430'Selected word line dependent select gate diffusion region voltage during programming'20148,773,902'Channel boosting using secondary neighbor channel coupling in non-volatile memory'20148,760,890'Current source inverter'20148,681,511'Alternating current-direct current converter device'20148,638,608'Selected word line dependent select gate voltage during program'20148,558,587'Gate driver'20138,552,408'Particle beam irradiation apparatus and control method of the particle beam irradiation apparatus'20138,503,853'Plastic optical fiber and plastic optical fiber code'20138,503,244'Fabricating and operating a memory array having a multi-level cell region and a single-level cell region'20138,487,282'Particle beam irradiation apparatus and control method of the particle beam irradiation apparatus'20138,354,322'Fabricating and operating a memory array having a multi-level cell region and a single-level cell region'20138,299,842'Bidirectional switch'20128,213,255'Non-volatile storage with temperature compensation based on neighbor state information'20128,163,622'Method for angular doping of source and drain regions for odd and even NAND blocks'20128,026,544'Fabricating and operating a memory array having a multi-level cell region and a single-level cell region'20117,942,594'Ribbon cartridge and printing apparatus'20117,902,031'Method for angular doping of source and drain regions for odd and even NAND blocks'20117,876,618'Non-volatile memory with reduced leakage current for unselected blocks and method for operating same'20117,719,902'Enhanced bit-line pre-charge scheme for increasing channel boosting in non-volatile storage'20107,534,690'Non-volatile memory with asymmetrical doping profile'20097,439,968'Display device'20087,294,882'Non-volatile memory with asymmetrical doping profile'2007D0547363'Ink ribbon cartridge'20077,160,462'Eluent for ion chromatography for measuring alkaline earth metal ions, and method for analyzing alkaline earth metal ions, employing it'20076,927,356'Enclosed switchgear'20056,865,072'Metal-enclosed switchgear'20056,835,942'Method for correcting a proximity effect, an exposure method, a manufacturing method of a semiconductor device and a proximity correction module'20046,567,455'Semiconductor laser-excited solid laser'20036,316,163'Pattern forming method'20016,314,121'Semiconductor laser-excitation solid-state laser device'2001D0448682'Wrist watch'20016,285,235'Gate control circuit for voltage drive switching element'20016,222,862'Control method of exciting a pulse laser and power supply unit for exciting a pulse laser'20016,204,511'Electron beam image picturing method and image picturing device'20016,189,860'Plastic butterfly valve'20016,161,056'Placement method and apparatus'20006,142,016'Apparatus for detecting residual quantity of toners'20006,121,178'Sintered ITO and an ITO sputtering target'20006,099,982'Starting powders for ITO production, ITO sinters and processes for producing such starting powders and ITO sinters'20006,093,931'Pattern-forming method and lithographic system'20006,038,244'Semiconductor excitation solid-state laser apparatus'20006,020,107'Pattern forming method through combined electron beam and light exposure utilizing multiple heat steps'20005,994,030'Pattern-forming method and lithographic system'19995,960,286'Method of manufacturing power semiconductor devices'19995,948,292'Laser beam machining apparatus, focus positioning device for laser beam machining apparatus, and converged laser beam diameter measuring device'1999D0402565'Watch case with band'19985,841,645'Multi-level inverter with low loss snubbing circuits'19985,818,058'Particle beam irradiation apparatus'19985,768,325'Time-adjustable delay circuit'19985,621,634'Power converter'19975,578,756'Method and apparatus for evaluating soundness of block-like structures'19965,563,122'Stabilized parathyroid hormone composition'19965,506,162'Method of producing a semiconductor integrated circuit device using a master slice approach'19965,298,111'Automatic wafer transfer apparatus and a method for transferring wafers and an etching drum'19945,246,528'Automatic wafer etching method and apparatus'19935,229,229'Pellicle having reflection-preventing function'19935,202,217'Solubilization-inhibitor and positive resist composition'19935,107,438'Control apparatus for inverter'19925,001,619'Harmonics suppression control circuit for a PWM inverter'19914,816,887'CMOS gate array with orthagonal gates'19894,809,029'Gate array large scale integrated circuit device'19894,733,288'Gate-array chip'19884,668,972'Masterslice semiconductor device'1987D0287471'Watch case'19864,620,885'Spring material for electric and electronic parts'19864,611,236'Masterslice semiconductor device'19864,152,504'Process for producing conjugated diene polymers'1979

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1991–2013Patents assigned to TOSHIBA KK (14)· patent assignee history
1997–2021Based in Tokyo, JP· patent location history
1998–2015Patents assigned to MITSUBISHI ELECTRIC CORP (10)· patent assignee history
1999–2017Based in Nagoya, JP· patent location history
2007–2016Based in Chigasaki, JP· patent location history
2011–2016Patents assigned to SANDISK TECHNOLOGIES INC (14)· patent assignee history
2012–2016Patents assigned to SATO SHINJI (26)· patent assignee history
2012–2018Based in Niiza, JP· patent location history
2014–2020Patents assigned to NIKON CORP (31)· patent assignee history
2014–2020Based in Fukaya, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NIKON CORP312014–2020
SATO SHINJIself262012–2016
SANDISK TECHNOLOGIES INC142011–2016
TOSHIBA KK141991–2013
MITSUBISHI ELECTRIC CORP101998–2015
Locations
LocationPatentsSpan
Fukaya, JP312014–2020
Tokyo, JP181997–2021
Chigasaki, JP182007–2016
Niiza, JP92012–2018
Nagoya, JP51999–2017