Inventor
Anthony DeBellis
Inventor
Stony Point, NY, US
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C07Dprimary
C07DHeterocyclic compounds27%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients18%
B41MPrinting, duplicating, marking, or copying processes9%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests9%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium7%
C09DCoating compositions, e.g. paints, varnishes or lacquers7%
E04BGeneral building constructions7%
C08JWorking-up4%
C08LCompositions of macromolecular compounds4%
C09KMaterials for miscellaneous applications, not provided for elsewhere2%
PatentTitleYear
7,541,096'Electroluminescent device'20097,244,776'Ultraviolet light absorbers'20077,173,128'Ultraviolet light absorbers'20077,166,659'Substituted 5-aryl-2-(2-hydroxyphenyl)-2H-benzotriazole UV absorbers, compositions stabilized therewith and process for preparation thereof'20077,148,274'Substituted 5-aryl-2-(2-hydroxyphenyl)-2h-benzotriazole UV absorbers, compositions stabilized therewith and process for preparation thereof'20066,790,874'Polyolefin materials having enhanced surface durability and methods of making the same by exposure to radiation'20046,774,238'Substituted 5-aryl-2-(2-hydroxyphenyl)-2H-benzotriazole UV absorbers, compositions stabilized therewith and process for preparation thereof'20046,703,510'Substituted 5-aryl-2-(2-hydroxyphenyl)-2H-benzotriazole UV absorbers, compositions stabilized therewith and process for preparation thereof'20046,649,770'Substituted 5-aryl-2-(2-hydroxyphenyl)-2H-benzotriazole UV absorbers, compositions stabilized therewith and process for preparation thereof'20036,515,051'Benzotriazole UV absorbers having enhanced durability'20036,488,882'Polyolefin materials having enhanced surface durability and methods of making the same by exposure to radiation'20026,489,383'2H-benzotriazole UV absorbers substituted with 1,1-diphenylalkyl groups and compositions stabilized therewith'20026,458,872'Benzotriazole UV absorbers having enhanced durability'20026,392,056'2H-benzotriazole UV absorders substituted with 1,1-diphenylalkyl groups and compositions stabilized therewith'20026,387,992'Substituted 5-heteroaryl-2-(2-hydroxyphenyl)-2h-benzotriazole UV absorbers, a process for preparation thereof and compositions stabilized therewith'20026,262,151'Benzotriazole UV absorbers having enhanced durability'20016,166,218'Benzotriazole UV absorbers having enhanced durability'20005,977,219'Benzotriazole UV absorbers having enhanced durability'1999Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1999–2009Patents assigned to CIBA SC HOLDING AG (17)· patent assignee history
1999–2004Based in Garnerville, NY, US· patent location history
2002–2004Patents assigned to SOLVAY ENGINEERED POLYMERS (2)· patent assignee history
2002Patents assigned to CIBA SPECIALTY CHEMICAL CORP (1)· patent assignee history
2002–2009Based in Stony Point, NY, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CIBA SC HOLDING AG | 17 | 1999–2009 |
| SOLVAY ENGINEERED POLYMERS | 2 | 2002–2004 |
| CIBA SPECIALTY CHEMICAL CORP | 1 | 2002 |
Locations
| Location | Patents | Span |
|---|---|---|
| Stony Point, New York, US | 11 | 2002–2009 |
| Garnerville, New York, US | 7 | 1999–2004 |