Inventor
Masamichi Hara
Inventor
Nirasaki, JP
Overview
Patents· 31 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material28%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1024%
H01LSemiconductor devices12%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
H01JElectric discharge tubes or discharge lamps6%
B01DSeparation3%
Y02CCapture, storage, sequestration or disposal of greenhouse gases [ghg]3%
F16KValves2%
H10NElectric solid-state devices not otherwise provided for2%
Y02PClimate change mitigation technologies in the production or processing of goods2%
PatentTitleYear
10,468,237Substrate processing apparatus201910,049,860Substrate processing apparatus20189,976,217Film forming method using reversible decomposition reaction20189,896,761'Trap assembly in film forming apparatus'20189,673,078'Cooling processing apparatus and method for operating the same'20179,404,180'Deposition device'20169,303,788'Load lock device'20169,293,417'Method for forming barrier film on wiring line'20169,202,728'Substrate mounting mechanism, and substrate processing apparatus'20159,121,515'Gate valve unit, substrate processing device and substrate processing method thereof'20159,062,374'Method for film formation, apparatus for film formation, and computer-readable recording medium'20158,992,686'Mounting table structure, film forming apparatus and raw material recovery method'20158,859,422'Method of forming copper wiring and method and system for forming copper film'20148,518,181'Film forming apparatus and film forming method'20138,408,025'Raw material recovery method and trapping mechanism for recovering raw material'20138,399,353'Methods of forming copper wiring and copper film, and film forming system'20138,349,283'Metal recovery method, metal recovery apparatus, gas exhaust system and film forming device using same'20138,277,889'Film formation method and film formation apparatus'20128,273,409'Method for film formation, apparatus for film formation, and computer-readable recording medium'20128,268,078'Method and apparatus for reducing particle contamination in a deposition system'20128,034,406'Integrated substrate processing in a vacuum processing tool'20117,959,985'Method of integrating PEALD Ta-containing films into Cu metallization'20117,772,111'Substrate processing method and fabrication process of a semiconductor device'20107,708,835'Film precursor tray for use in a film precursor evaporation system and method of using'20107,638,002'Multi-tray film precursor evaporation system and thin film deposition system incorporating same'20097,501,304'Method of cleaning cover glass having spacer'20097,488,512'Method for preparing solid precursor tray for use in solid precursor evaporation system'20097,484,315'Replaceable precursor tray for use in a multi-tray solid precursor delivery system'20097,459,396'Method for thin film deposition using multi-tray film precursor evaporation system'20087,332,426'Substrate processing method and fabrication process of a semiconductor device'20087,096,645'Method of and apparatus for packaging rolled article'2006Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2006–2009Based in Minami-ashigara, JP· patent location history
2008–2019Patents assigned to TOKYO ELECTRON LTD (29)· patent assignee history
2008–2012Based in Clifton Park, NY, US· patent location history
2008–2013Based in Albany, NY, US· patent location history
2011–2018Based in Yamanashi, JP· patent location history
2012–2016Patents assigned to HARA MASAMICHI (14)· patent assignee history
2012–2016Patents assigned to GOMI ATSUSHI (11)· patent assignee history
2012–2015Patents assigned to HATANO TATSUO (8)· patent assignee history
2012–2015Patents assigned to MIZUSAWA YASUSHI (8)· patent assignee history
2012–2019Based in Nirasaki, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 29 | 2008–2019 |
| HARA MASAMICHIself | 14 | 2012–2016 |
| GOMI ATSUSHI | 11 | 2012–2016 |
| HATANO TATSUO | 8 | 2012–2015 |
| MIZUSAWA YASUSHI | 8 | 2012–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Nirasaki, JP | 14 | 2012–2019 |
| Clifton Park, New York, US | 7 | 2008–2012 |
| Yamanashi, JP | 5 | 2011–2018 |
| Albany, New York, US | 3 | 2008–2013 |
| Minami-ashigara, JP | 2 | 2006–2009 |