Inventor
Shoji Yoshikawa
Inventor
Tokyo, JP
Overview
Patents· 82 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps30%
G01NInvestigating or analysing materials by determining their chemical or physical properties26%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
G11BInformation storage based on relative movement between record carrier and transducer7%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
B82YSpecific uses or applications of nanostructures4%
G01RMeasuring electric variables3%
B64GCosmonautics3%
H01LSemiconductor devices2%
B21CManufacture of metal sheets, wire, rods, tubes, profiles or like semi-manufactured products otherwise than by rolling2%
PatentTitleYear
10,446,404Electron-beam irradiated area adjustment method and adjustment system, electron-beam irradiated region correction method, and electron beam irradiation apparatus201910,157,722Inspection device201810,074,510Inspection system and inspection image data generation method20189,852,878Surface processing apparatus20179,601,302'Inspection apparatus'20179,406,480'Testing apparatus using charged particles and device manufacturing method using the testing apparatus'20169,368,314'Inspection system by charged particle beam and method of manufacturing devices using the system'20169,134,261'Inspection apparatus'20159,105,445'Inspection system, inspection image data generation method, inspection display unit, defect determination method, and storage medium on which inspection display program is recorded'20158,946,629'Inspection apparatus'20158,946,631'Testing apparatus using charged particles and device manufacturing method using the testing apparatus'20158,884,225'Sample observing device and sample observing method'20148,822,919'Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former'20148,803,103'Inspection system by charged particle beam and method of manufacturing devices using the system'20148,796,621'Detector and inspecting apparatus'20148,742,344'Inspection apparatus'20148,742,341'Testing apparatus using charged particles and device manufacturing method using the testing apparatus'20148,497,476'Inspection device'20138,431,892'Detector and inspecting apparatus'20138,368,031'Inspection system by charged particle beam and method of manufacturing devices using the system'20138,053,726'Inspection system by charged particle beam and method of manufacturing devices using the system'20117,928,382'Detector and inspecting apparatus'20117,928,378'Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former'20117,888,642'Electron beam apparatus and method of manufacturing semiconductor device using the apparatus'20117,829,871'Sheet beam-type testing apparatus'20107,745,784'Electron beam apparatus and method of manufacturing semiconductor device using the apparatus'20107,741,601'Testing apparatus using charged particles and device manufacturing method using the testing apparatus'20107,601,972'Inspection system by charged particle beam and method of manufacturing devices using the system'20097,599,052'Method for marking defect and device therefor'20097,569,838'Electron beam inspection system and inspection method and method of manufacturing devices using the system'20097,479,634'Electron beam apparatus and device manufacturing method using the same'20097,439,502'Electron beam apparatus and device production method using the electron beam apparatus'20087,423,267'Electron beam apparatus and method of manufacturing semiconductor device using the apparatus'20087,423,744'Method for marking defect and device therefor'20087,417,236'Sheet beam-type testing apparatus'20087,411,191'Inspection system by charged particle beam and method of manufacturing devices using the system'20087,408,175'Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former'20087,403,279'Information recording medium examining apparatus and method'20087,365,324'Testing apparatus using charged particles and device manufacturing method using the testing apparatus'20087,351,969'Electron beam inspection system and inspection method and method of manufacturing devices using the system'20087,305,149'Image pickup information recognition system'20077,297,949'Inspection system by charged particle beam and method of manufacturing devices using the system'20077,248,366'Method for marking defect and device therefor'20077,247,848'Electron beam apparatus and method of manufacturing semiconductor device using the apparatus'20077,244,932'Electron beam apparatus and device fabrication method using the electron beam apparatus'20077,241,993'Inspection system by charged particle beam and method of manufacturing devices using the system'20077,223,973'Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former'20077,205,540'Electron beam apparatus and device manufacturing method using same'20077,157,703'Electron beam system'20077,138,629'Testing apparatus using charged particles and device manufacturing method using the testing apparatus'20067,135,676'Inspection system by charged particle beam and method of manufacturing devices using the system'20067,129,485'Electron beam apparatus and method of manufacturing semiconductor device using the apparatus'20067,109,484'Sheet beam-type inspection apparatus'20067,109,483'Method for inspecting substrate, substrate inspecting system and electron beam apparatus'20067,095,022'Electron beam apparatus and method of manufacturing semiconductor device using the apparatus'20067,049,585'Sheet beam-type testing apparatus'20067,025,005'Stage device and angle detecting device'20066,998,611'Electron beam apparatus and device manufacturing method using same'20066,992,290'Electron beam inspection system and inspection method and method of manufacturing devices using the system'20066,855,929'Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former'20056,593,152'Electron beam apparatus and method of manufacturing semiconductor device using the apparatus'20036,523,786'Apparatus for determining attitude of artificial satellite'20036,480,787'GPS receiving system'20026,227,496'Attitude determination system for artificial satellite'20016,166,684'Artificial satellite navigation system and method'20006,167,144'Image processing apparatus and image processing method for identifying a landing location on the moon or planets'20006,102,338'Attitude determination system for artificial satellite'20005,657,301'Automatic changer system capable of rewriting a control program for controlling the system'19975,109,367'Optical information recording and reproducing apparatus performing focus and/or track control by normalized error signals'19925,048,002'Photodisc apparatus with means for canceling offset of tracking servo loop'19915,014,256'Photodisc apparatus with gain control of tracking servo loop'19914,797,866'Optical recording/reproducing apparatus'19894,764,911'Optical lens vibration control for optical information recording and/or reproducing apparatus'19884,706,232'Optical recording and reproducing apparatus'19874,692,606'Modulated light source with power stabilized according to data signal'19874,651,314'Optical recording and reproducing equipment'19874,577,320'Light power controlling apparatus'19864,571,728'Temperature control device for a semiconductor laser'19864,505,585'System for detecting defects on an optical surface'19854,499,514'Disc drive apparatus'19854,495,407'System for focusing an optical head onto a flat surface'19854,464,050'Apparatus for detecting optically defects'1984Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1984–1992Patents assigned to OLYMPUS OPTICAL CO (14)· patent assignee history
1984–2016Based in Hachioji, JP· patent location history
1985–2019Based in Tokyo, JP· patent location history
2000–2007Patents assigned to MITSUBISHI ELECTRIC CORP (7)· patent assignee history
2003–2019Patents assigned to EBARA CORP (54)· patent assignee history
2006–2014Patents assigned to TOSHIBA KK (8)· patent assignee history
2013–2014Patents assigned to HATAKEYAMA MASAHIRO (5)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| EBARA CORP | 54 | 2003–2019 |
| OLYMPUS OPTICAL CO | 14 | 1984–1992 |
| TOSHIBA KK | 8 | 2006–2014 |
| MITSUBISHI ELECTRIC CORP | 7 | 2000–2007 |
| HATAKEYAMA MASAHIRO | 5 | 2013–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 63 | 1985–2019 |
| Hachioji, JP | 19 | 1984–2016 |