Inventor
Manabu Edamura
Inventor
Ibaraki, JP
Overview
Patents· 26 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps40%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
B82YSpecific uses or applications of nanostructures9%
G01QScanning-probe techniques or apparatus9%
C23CCoating metallic material7%
H05HPlasma technique4%
B01DSeparation2%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry2%
C30BSingle-crystal growth2%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light2%
PatentTitleYear
8,844,061'Scanning probe microscope'20148,342,008'Scanning probe microscope'20138,231,759'Plasma processing apparatus'20128,083,889'Apparatus and method for plasma etching'20118,011,230'Scanning probe microscope'20117,744,721'Plasma processing apparatus'20107,713,756'Apparatus and method for plasma etching'20107,631,548'Scanning probe microscope'20097,194,821'Vacuum processing apparatus and vacuum processing method'20076,911,157'Plasma processing method and apparatus using dynamic sensing of a plasma environment'20056,850,012'Plasma processing apparatus'20056,846,363'Plasma processing apparatus and method'20056,833,051'Plasma processing apparatus and method'20046,812,725'Semiconductor processing apparatus and wafer sensor module'20046,793,768'Plasma-assisted processing apparatus'20046,756,737'Plasma processing apparatus and method'20046,499,424'Plasma processing apparatus and method'20026,481,370'Plasma processsing apparatus'20026,388,382'Plasma processing apparatus and method'20026,245,202'Plasma treatment device'20016,180,019'Plasma processing apparatus and method'20016,172,321'Method and apparatus for plasma processing apparatus'20016,034,346'Method and apparatus for plasma processing apparatus'20005,556,204'Method and apparatus for detecting the temperature of a sample'19965,536,359'Semiconductor device manufacturing apparatus and method with optical monitoring of state of processing chamber'19965,259,735'Evacuation system and method therefor'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1993–2014Patents assigned to HITACHI LTD (20)· patent assignee history
1993–2014Based in Ibaraki, JP· patent location history
2001–2004Based in Niihari-gun, JP· patent location history
2002–2005Based in Chiyoda-ku, JP· patent location history
2005–2012Patents assigned to HITACHI HIGH TECH CORP (6)· patent assignee history
2009–2013Based in Kasumigaura, JP· patent location history
2011–2014Patents assigned to EDAMURA MANABU (4)· patent assignee history
2013–2014Patents assigned to BABA SHUICHI (2)· patent assignee history
2013–2014Patents assigned to KEMBO YUKIO (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI LTD | 20 | 1993–2014 |
| HITACHI HIGH TECH CORP | 6 | 2005–2012 |
| EDAMURA MANABUself | 4 | 2011–2014 |
| BABA SHUICHI | 2 | 2013–2014 |
| KEMBO YUKIO | 2 | 2013–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Ibaraki, JP | 16 | 1993–2014 |
| Chiyoda-ku, JP | 5 | 2002–2005 |
| Kasumigaura, JP | 3 | 2009–2013 |
| Niihari-gun, JP | 2 | 2001–2004 |