Inventor

Yasuhito Yoshimizu

Inventor
Yokkaichi, JP

Overview

40→
Patents
2012–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 40 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Lprimary
H01LSemiconductor devices24%
H10BElectronic memory devices17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1013%
H10DInorganic electric semiconductor devices10%
H10NElectric solid-state devices not otherwise provided for8%
G11CStatic stores6%
H01FMagnets2%
C23CCoating metallic material1%
C23FNon-mechanical removal of metallic material from surface1%
PatentTitleYear
10,879,087Substrate treatment apparatus and manufacturing method of semiconductor device202010,854,534Semiconductor device and method for manufacturing same202010,804,221Substrate treatment apparatus, method of manufacturing semiconductor device and workpiece substrate202010,720,321Substrate treating method and semiconductor device manufacturing method202010,580,784Memory device and method for manufacturing memory device202010,573,662Memory device and method for manufacturing memory device202010,529,588Substrate treatment method and substrate treatment apparatus202010,515,873Semiconductor device and method for manufacturing same201910,482,941Magnetic memory device201910,446,249Magnetic memory device201910,446,212Magnetic memory device201910,403,381Magnetic memory device201910,354,739Magnetic memory device including magnetic portions nonmagnetic layers201910,319,734Semiconductor memory device having air gap201910,319,740Memory device and method for manufacturing memory device201910,312,255Semiconductor device and method for manufacturing same201910,311,932Magnetic memory device201910,304,902Magnetic memory device201910,276,586Semiconductor device and method for manufacturing same201910,249,531Method for forming metal wiring201910,192,882Semiconductor device and method for manufacturing same201910,147,612Metal pattern forming method201810,096,613Semiconductor device and method for manufacturing same201810,014,186Substrate treatment method and substrate treatment apparatus20189,997,533Semiconductor device and method for manufacturing same20189,991,159Semiconductor device manufacture method20189,793,293'Semiconductor device and method for manufacturing same'20179,673,217'Semiconductor device and method for manufacturing same'20179,653,475'Semiconductor device and method of manufacturing the same'20179,646,989'Three-dimensional memory device'20179,384,980'Manufacturing method of semiconductor device'20169,065,064'Manufacturing method and manufacturing apparatus of functional element'20158,952,441'Nonvolatile semiconductor memory device and method of manufacturing the same'20158,865,563'Film embedding method and semiconductor device'20148,772,164'Method for forming interconnection pattern and semiconductor device'20148,741,168'Wet etching method for silicon nitride film'20148,695,145'Cleaning method, cleaning apparatus'20148,567,420'Cleaning apparatus for semiconductor wafer'20138,546,786'Stacked multiple cell nonvolatile memory device'20138,115,245'Nonvolatile memory device'2012

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2012–2018Patents assigned to TOSHIBA KK (14)· patent assignee history
2012–2014Patents assigned to YOSHIMIZU YASUHITO (6)· patent assignee history
2012–2014Based in Kanagawa, JP· patent location history
2013–2014Patents assigned to TOMITA HIROSHI (4)· patent assignee history
2013–2014Based in Yokohama, JP· patent location history
2014Patents assigned to OKUCHI HISASHI (3)· patent assignee history
2014–2020Based in Mie, JP· patent location history
2015–2020Based in Yokkaichi, JP· patent location history
2017–2020Patents assigned to TOSHIBA MEMORY CORP (26)· patent assignee history
2019Based in Mie-gun, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOSHIBA MEMORY CORP262017–2020
TOSHIBA KK142012–2018
YOSHIMIZU YASUHITOself62012–2014
TOMITA HIROSHI42013–2014
OKUCHI HISASHI32014
Locations
LocationPatentsSpan
Yokkaichi, JP182015–2020
Mie, JP152014–2020
Kanagawa, JP42012–2014
Yokohama, JP22013–2014
Mie-gun, JP12019