Inventor
Henry I. Smith
Inventor
Sudbury, MA, US
Overview
Patents· 52 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices26%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests12%
C30BSingle-crystal growth9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
Y10TTechnical subjects covered by former us classification7%
B82YSpecific uses or applications of nanostructures6%
H01JElectric discharge tubes or discharge lamps5%
G02BOptical elements, systems or apparatus4%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein3%
G21KHandling of particles or ionising radiation not otherwise provided for3%
PatentTitleYear
10,046,550Carrier-substrate adhesive system20189,359,198'Carrier-substrate adhesive system'20168,143,601'Nanoscale imaging via absorption modulation'20128,121,162'Nanocrystal structures'20127,714,988'System and method for absorbance modulation lithography'20107,713,684'System and method for absorbance modulation lithography'20107,667,819'System and method for contrast enhanced zone plate array lithography'20107,666,580'System and method for contrast enhanced zone plate array lithography'20107,470,473'Nanocrystal structures'20087,417,234'Spatial-phase locking of energy beams for determining two-dimensional location and beam shape'20087,405,806'Imaging system and method employing beam folding'20087,348,104'System and method for fabrication and replication of diffractive optical elements for maskless lithography'20087,304,318'System and method for maskless lithography using an array of sources and an array of focusing elements'20077,303,860'System and method for performing multi-resolution lithography'20077,193,782'System and method for manipulating micro-particles using electromagnetic fields'20077,160,673'System and method for holographic fabrication and replication of diffractive optical elements for maskless lithography'20077,150,910'Nanocrystal structures'20067,148,496'System and method for proximity effect correction in imaging systems'20066,960,773'System and method for maskless lithography using an array of improved diffractive focusing elements'20056,894,292'System and method for maskless lithography using an array of sources and an array of focusing elements'20056,822,248'Spatial phase locking with shaped electron beam lithography'20046,522,411'Optical gap measuring apparatus and method having two-dimensional grating mark with chirp in one direction'20036,404,481'Adaptive lithography membrane masks'20026,088,103'Optical interference alignment and gapping apparatus'20005,915,051'Wavelength-selective optical add/drop switch'19995,900,637'Maskless lithography using a multiplexed array of fresnel zone plates'19995,892,230'Scintillating fiducial patterns'19995,808,742'Optical alignment apparatus having multiple parallel alignment marks'19985,809,103'X-ray lithography masking'19985,639,300'Epitaxy with reusable template'19975,620,573'Reduced stress tungsten deposition'19975,414,514'On-axis interferometric alignment of plates using the spatial phase of interference patterns'19955,142,385'Holographic lithography'19925,136,169'Energy beam locating'19925,122,223'Graphoepitaxy using energy beams'19925,014,360'Removing perspiration'19914,890,309'Lithography mask with a .pi.-phase shifting attenuator'19894,632,723'Orientation filtering for crystalline films'19864,576,676'Thick crystalline films on foreign substrates'19864,565,599'Graphoepitaxy by encapsulation'19864,562,106'Product made by method of entraining dislocations and other crystalline defects'19854,479,846'Method of entraining dislocations and other crystalline defects in heated film contacting patterned region'19844,370,194'Orientation of ordered liquids and their use in devices'19834,360,586'Spatial period division exposing'19824,340,305'Plate aligning'19824,333,792'Enhancing epitaxy and preferred orientation'19824,256,787'Orientation of ordered liquids and their use in devices'19814,254,174'Supported membrane composite structure and its method of manufacture'19814,200,395'Alignment of diffraction gratings'19804,170,512'Method of manufacture of a soft-X-ray mask'19794,075,706'Surface wave devices for processing signals'19783,984,680'Soft X-ray mask alignment system'1976Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1976–2018Patents assigned to MASSACHUSETTS INST TECHNOLOGY (48)· patent assignee history
1976–2018Based in Sudbury, MA, US· patent location history
1991–2012Patents assigned to SMITH HENRY I (3)· patent assignee history
2004Patents assigned to IBM (1)· patent assignee history
2012Patents assigned to BAWENDI MOUNGI G (1)· patent assignee history
2012Patents assigned to EISLER HANS J (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MASSACHUSETTS INST TECHNOLOGY | 48 | 1976–2018 |
| SMITH HENRY Iself | 3 | 1991–2012 |
| BAWENDI MOUNGI G | 1 | 2012 |
| EISLER HANS J | 1 | 2012 |
| IBM | 1 | 2004 |
Locations
| Location | Patents | Span |
|---|---|---|
| Sudbury, Massachusetts, US | 52 | 1976–2018 |