Inventor
Hitoshi Matsuura
Inventor
Hachioji, JP
Overview
Patents· 115 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices20%
H01LSemiconductor devices14%
B23QDetails, components, or accessories for machine tools, e.g. arrangements for copying or controlling13%
G05BControl or regulating systems in general11%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
H01FMagnets8%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h107%
Y10TTechnical subjects covered by former us classification7%
B22FWorking metallic powder4%
C22CAlloys4%
PatentTitleYear
10,818,783Semiconductor device and manufacturing method therefor202010,658,103Coil component202010,651,301Semiconductor device and method of manufacturing the same202010,600,896Semiconductor device and method for producing the same202010,475,882Semiconductor device201910,366,985Semiconductor device having a sense IGBT for current detection of a main IGBT201910,312,357Trench gate IGBT201910,304,949Semiconductor device and manufacturing method therefor201910,304,951IE type trench gate IGBT201910,290,729Narrow active cell IE type trench gate IGBT and a method for manufacturing a narrow active cell IE type trench gate IGBT201910,276,702Semiconductor device201910,269,946Semiconductor device and method of manufacturing the same201910,243,068Semiconductor device201910,229,989Semiconductor device and manufacturing method therefor201910,181,440Semiconductor device201910,147,810Semiconductor device and method of manufacturing same201810,115,652Semiconductor device and semiconductor apparatus201810,077,826Manufacturing method for fluid coupling and fluid coupling201810,043,895Semiconductor device201810,032,896Semiconductor device and manufacturing method thereof201810,032,895Semiconductor device and method for manufacturing the same20189,997,622IE type trench gate IGBT20189,997,621Semiconductor device and manufacturing method of the same20189,941,396Semiconductor device and method of manufacturing same20189,871,127'Semiconductor device and method for manufacturing the same'20189,847,410Semiconductor device and method of manufacturing the same20179,842,919'Semiconductor device'20179,825,167'Method of manufacturing a P-channel power MOSFET'20179,818,853'Semiconductor device and manufacturing method thereof'20179,786,771'Semiconductor device with contact groove arrangements providing improved performance'20179,754,877'Semiconductor device'20179,685,267'Coil component'20179,653,587'IE type trench gate IGBT'20179,614,066'Semiconductor device provided with an IE type trench IGBT'20179,472,341'Method for manufacturing magnetic grain compact'20169,368,595'Semiconductor device provided with an IE type trench IGBT'20169,349,827'IGBT and diode'20169,349,517'Coil component'20169,293,244'Magnetic material and coil component using the same'20169,287,026'Magnetic material and coil component'20169,287,033'Magnetic material and coil component using same'20169,165,705'Laminated inductor'20159,064,839'IGBT and diode'20159,041,050'IE type trench gate IGBT'20159,030,285'Magnetic material and coil component using same'20158,937,350'Semiconductor device and method of manufacturing the same'20158,813,346'Method for manufacturing a coil-type electronic component'20148,749,339'Coil-type electronic component and process for producing same'20148,723,634'Coil-type electronic component and its manufacturing method'20148,704,629'Coil-type electronic component and its manufacturing method'20148,659,078'Semiconductor device and method of manufacturing the same'20148,633,510'IE-type trench gate IGBT'20148,610,525'Laminated inductor'20138,558,652'Laminated inductor and manufacturing method thereof'20138,525,630'Laminated inductor'20138,471,333'Semiconductor device and manufacturing method of the same'20138,455,943'Power MISFET semiconductor device'20138,427,265'Laminated inductor'20138,416,051'Magnetic material and coil component using the same'20138,405,145'Semiconductor device and method of manufacturing the same'20138,362,866'Coil component'20138,232,161'Semiconductor device and manufacturing method of the same'20128,187,941'Method of manufacturing semiconductor device'20128,030,704'Method of manufacturing semiconductor device'20117,999,345'Semiconductor device and manufacturing method thereof'20117,968,939'Semiconductor device and method of manufacturing the same'20117,880,225'Semiconductor device and manufacturing method of the same'20117,847,347'Semiconductor device and method of manufacturing the same'20107,759,730'Semiconductor device and method of manufacturing the same'20107,659,575'Semiconductor device'20107,595,242'Method of manufacturing a superjunction power MOSFET with self-aligned trench gate'20097,544,568'Semiconductor device and method of manufacturing the same'20097,083,368'Numerical control apparatus'20065,550,330'Digitizing control apparatus'19965,477,119'Tracing control system'19955,426,356'Non-contact profile control method'19955,345,687'Noncontact tracing control device'19945,343,402'Non-contact digitizing control unit'19945,341,079'Tracking control system'19945,333,974'Tracer control unit'19945,327,351'Non-contact digitizing method'19945,317,517'Digitizing method'19945,283,509'Tracing control system'19945,274,563'Noncontact tracing control system'19935,266,811'Digitizing control equipment utilizing normal vector calculations and a position sensor'19935,247,233'Digitizing control device for generating tracing data'19935,243,265'Non-contact tracing control apparatus'19935,241,485'Noncontact tracing control system'19935,241,484'Tracing control method'19935,209,618'Method of setting tracing zone'19935,182,714'Digitizing control apparatus'19935,180,957'Tracing control system'19935,140,239'Non-contact tracer control device'19925,136,224'Digitizing method'19925,121,041'Tracing control system'19925,115,099'Substrates for determination of enzyme activity and intermediates for synthesis of the substrates as well as process for producing the intermediates'19925,071,252'Method for contactless profiling normal to a surface'19915,015,130'Contour profiling machine'19914,967,364'Arbitrary-direction tracer control system'19904,962,460'Digitizing apparatus for digitizing a model surface using a contactless probe'19904,949,024'Contactless profiling method'19904,870,337'Pick-feed method in tracing of a rotating body'19894,792,738'Machine position sensing device'19884,709,482'Arbitrary-direction tracer control unit'19874,703,239'Arbitrary-direction tracer control unit'19874,646,225'Adaptive feed rate controller for tracer head'19874,639,172'Trace control method'19874,620,142'Sequence switching system in tracer control unit'19864,603,285'Tracer control method'19864,575,665'Tracer control method'19864,504,772'Method of sensing current position in position control system'19854,503,372'Method and apparatus for sensing present position in position control system'19854,495,561'Numerical control method'19854,485,338'Method and apparatus for sensing current position in position control system'19844,426,180'Tracer control system'1984Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1984–2006Patents assigned to FANUC LTD (40)· patent assignee history
1984–2006Based in Hachioji, JP· patent location history
1986–2016Based in Tokyo, JP· patent location history
2010–2020Patents assigned to RENESAS ELECTRONICS CORP (46)· patent assignee history
2012–2016Patents assigned to MATSUURA HITOSHI (21)· patent assignee history
2013–2020Patents assigned to TAIYO YUDEN KK (19)· patent assignee history
2013–2016Patents assigned to OTAKE KENJI (10)· patent assignee history
2013–2020Based in Takasaki, JP· patent location history
2016–2020Based in Ibaraki, JP· patent location history
2017–2020Based in Hitachinaka, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| RENESAS ELECTRONICS CORP | 46 | 2010–2020 |
| FANUC LTD | 40 | 1984–2006 |
| MATSUURA HITOSHIself | 21 | 2012–2016 |
| TAIYO YUDEN KK | 19 | 2013–2020 |
| OTAKE KENJI | 10 | 2013–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hachioji, JP | 34 | 1984–2006 |
| Tokyo, JP | 23 | 1986–2016 |
| Ibaraki, JP | 20 | 2016–2020 |
| Takasaki, JP | 18 | 2013–2020 |
| Hitachinaka, JP | 7 | 2017–2020 |