Inventor
Albert Pieter Rijpma
Inventor
Veldhoven, NL
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices36%
F15DFluid dynamics, i.e. methods or means for influencing the flow of gases or liquids14%
G21KHandling of particles or ionising radiation not otherwise provided for14%
H05GX-ray technique14%
Y10TTechnical subjects covered by former us classification14%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them7%
PatentTitleYear
10,394,141Radiation source and lithographic apparatus20199,753,383'Radiation source and lithographic apparatus'20178,797,504'Lithographic apparatus and device manufacturing method'20148,730,448'Lithographic apparatus and device manufacturing method'20148,228,487'Lithographic apparatus and device manufacturing method'2012Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2012–2019Patents assigned to ASML NETHERLANDS BV (5)· patent assignee history
2012–2014Patents assigned to RIJPMA ALBERT PIETER (3)· patent assignee history
2012–2019Based in Veldhoven, NL· patent location history
2014Patents assigned to BAL KURSAT (2)· patent assignee history
2014Patents assigned to CUIJPERS MARTINUS AGNES WILLEM (2)· patent assignee history
2014Patents assigned to GALAKTIONOV OLEKSIY (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 5 | 2012–2019 |
| RIJPMA ALBERT PIETERself | 3 | 2012–2014 |
| BAL KURSAT | 2 | 2014 |
| CUIJPERS MARTINUS AGNES WILLEM | 2 | 2014 |
| GALAKTIONOV OLEKSIY | 2 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Veldhoven, NL | 5 | 2012–2019 |