Inventor

Katsuhiko Murakami

Inventor

Sagamihara, JP

Overview

33→

Patents

1976–2018

Patent span

Physics

Primary field (CPC G)

Patents· 33 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices26%

B82YSpecific uses or applications of nanostructures22%

G21KHandling of particles or ionising radiation not otherwise provided for20%

G02BOptical elements, systems or apparatus11%

H05GX-ray technique5%

G01GWeighing4%

B22DCasting of metals2%

C30BSingle-crystal growth2%

H10NElectric solid-state devices not otherwise provided for2%

A22CProcessing meat, poultry, or fish1%

PatentTitleYear

10,126,660Multilayer film reflector, method of manufacturing multilayer film reflector, projection optical system, exposure apparatus, and method of manufacturing device2018 8,809,818'EUV light source, EUV exposure apparatus, and electronic device manufacturing method'2014 8,121,254'Optical element, exposure apparatus using this, and device manufacturing method'2012 7,741,616'EUV light source, EUV exposure equipment, and semiconductor device manufacturing method'2010 7,706,058'Multilayer mirror, method for manufacturing the same, and exposure equipment'2010 7,456,417'Laser plasma EUV light source, target material, tape material, a method of producing target material, a method of providing targets, and an EUV exposure device'2008 7,440,182'Multilayer mirror, method for manufacturing the same, and exposure equipment'2008 7,417,708'Extreme ultraviolet exposure apparatus and vacuum chamber'2008 7,385,212'Collector optical system, light source unit, illumination optical apparatus, and exposure apparatus'2008 7,382,527'EUV multilayer mirror with phase shifting layer'2008 6,909,774'Apparatus and methods for surficial milling of selected regions on surfaces of multilayer-film reflective mirrors as used in X-ray optical systems'2005 6,861,656'High-luminosity EUV-source devices for use in extreme ultraviolet (soft X-ray) lithography systems and other EUV optical systems'2005 6,522,717'Reflective-type soft x-ray microscope'2003 6,522,716'Multilayer-film reflective mirrors, extreme UV microlithography apparatus comprising same, and microelectronic-device manufacturing methods utilizing same'2003 6,507,641'X-ray-generation devices, X-ray microlithography apparatus comprising same, and microelectronic-device fabrication methods utilizing same'2003 6,441,963'Multi-layered mirror'2002 6,377,655'Reflective mirror for soft x-ray exposure apparatus'2002 6,333,961'Reflection masks, microlithography apparatus using same, and integrated circuit manufacturing methods employing same'2001 6,295,164'Multi-layered mirror'2001 6,160,867'Multi-layer X-ray-reflecting mirrors with reduced internal stress'2000 5,581,605'Optical element, production method of optical element, optical system, and optical apparatus'1996 5,572,564'Reflecting photo mask for x-ray exposure and method for manufacturing the same'1996 5,534,703'Electrophoresis analyzer with wavelength selective detection'1996 5,501,430'Immersion nozzle for continuous casting'1996 5,399,448'Reflection mask for X ray'1995 5,239,566'Multi-layered mirror'1993 5,067,551'Method for manufacturing alloy rod having giant magnetostriction'1991 5,063,986'Method for manufacturing alloy rod having giant magnetostriction'1991 4,552,262'Article feeding apparatus'1985 4,421,185'Combinatorial weighing system'1983 4,186,792'Apparatus for monitoring and controlling the level of the molten metal in the mold of a continuous casting machine'1980 3,974,888'Method of weighing and apparatus therefor'1976 3,939,928'Weighing method and apparatus'1976

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1976Patents assigned to ISHIDA KOKI SEISAKUSYO KK (2)· patent assignee history

1980–1996Patents assigned to NIPPON KOKAN KK (4)· patent assignee history

1983–1985Patents assigned to ISHIDA SCALE MFG CO LTD (2)· patent assignee history

1983–1985Based in Shiga, JP· patent location history

1991Patents assigned to JAPAN MARINE SCIENCE & TECH (2)· patent assignee history

1991–2008Based in Tokyo, JP· patent location history

1993–2018Patents assigned to NIKON CORP (24)· patent assignee history

1993–2003Based in Kawasaki, JP· patent location history

1996–2008Based in Kanagawa, JP· patent location history

2003–2018Based in Sagamihara, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
NIKON CORP	24	1993–2018
NIPPON KOKAN KK	4	1980–1996
ISHIDA KOKI SEISAKUSYO KK	2	1976
ISHIDA SCALE MFG CO LTD	2	1983–1985
JAPAN MARINE SCIENCE & TECH	2	1991

Locations

Location	Patents	Span
Sagamihara, JP	10	2003–2018
Kawasaki, JP	10	1993–2003
Tokyo, JP	4	1991–2008
Kanagawa, JP	3	1996–2008
Shiga, JP	2	1983–1985