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Inventor

Scott R. Cline

Inventor
Enosburg Falls, VT, US

Overview

6→
Patents
2001–2005
Patent span
Performing operations
Primary field (CPC B)

Patents· 6 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B24Bprimary
B24BMachines, devices, or processes for grinding or polishing36%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1036%
B08BCleaning in general18%
G01NInvestigating or analysing materials by determining their chemical or physical properties9%
PatentTitleYear
6,899,784'Apparatus for detecting CMP endpoint in acidic slurries'20056,878,629'Method for detecting CMP endpoint in acidic slurries'20056,500,272'System for and method of purging/venting a brush arm bearing'20026,273,797'In-situ automated CMP wedge conditioner'20016,247,368'CMP wet application wafer sensor'20016,186,873'Wafer edge cleaning'2001

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001–2005Patents assigned to IBM (5)· patent assignee history
2001–2002Based in Enosburg Falls, VT, US· patent location history
2005Patents assigned to ECOPHYSICS AG (1)· patent assignee history
2005Based in Belle Plaine, MN, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
IBM52001–2005
ECOPHYSICS AG12005
Locations
LocationPatentsSpan
Enosburg Falls, VT, US42001–2002
Belle Plaine, Minnesota, US22005