Inventor
Kazuhito Furuya
Inventor
Yokohama, JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
G02BOptical elements, systems or apparatus17%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light17%
H10DInorganic electric semiconductor devices17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
PatentTitleYear
5,436,096'Method of manufacturing X-ray exposure mask'19955,412,231'Semiconductor device having organically doped structure'19955,364,717'Method of manufacturing X-ray exposure mask'19944,582,390'Dielectric optical waveguide and technique for fabricating same'19864,464,762'Monolithically integrated distributed Bragg reflector laser'19844,354,898'Method of preferentially etching optically flat mirror facets in InGaAsP/InP heterostructures'1982Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1982–1984Patents assigned to BELL TELEPHONE LABOR INC (2)· patent assignee history
1982–1986Based in Hazlet, NJ, US· patent location history
1986Patents assigned to AT & T BELL LAB (1)· patent assignee history
1994–1995Patents assigned to TOKYO INST TECH (3)· patent assignee history
1994–1995Based in Yokohama, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO INST TECH | 3 | 1994–1995 |
| BELL TELEPHONE LABOR INC | 2 | 1982–1984 |
| AT & T BELL LAB | 1 | 1986 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yokohama, JP | 3 | 1994–1995 |
| Hazlet, New Jersey, US | 3 | 1982–1986 |