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Inventor

Osamu Masuda

Inventor
Machida, JP

Overview

19→
Patents
1993–2021
Patent span
Physics
Primary field (CPC G)

Patents· 19 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G02Bprimary
G02BOptical elements, systems or apparatus12%
G11BInformation storage based on relative movement between record carrier and transducer8%
B23KSoldering or unsoldering6%
B29DProducing particular articles from plastics or from substances in a plastic state6%
B82YSpecific uses or applications of nanostructures6%
H01JElectric discharge tubes or discharge lamps6%
F21SNon-portable lighting devices4%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein4%
LOC164%
B05DProcesses for applying fluent materials to surfaces, in general2%
PatentTitleYear
10,883,880Optical characteristic evaluation method and optical characteristic evaluation system2021D0860304Eyeglasses2019D0848523Eyeglasses20199,513,313'Method for inspecting electronic device and electronic device inspection apparatus'20168,777,469'Light source module and vehicular lamp'20148,292,479'Vehicular infrared irradiation lamp'20128,000,210'Quarter-wave plate, and optical pickup device'20117,907,499'Optical element, optical element manufacturing method and optical pickup device'20117,466,488'Optical element producing method and optical element'20087,329,378'Molding method, cooling apparatus and optical element'20087,319,558'Wide-band wave plate and a controlling method thereof'20087,312,447'Electron beam depicting method, mother die manufacturing method, mother die, metallic mold manufacturing method, metallic mold and optical element'20077,060,175'Producing method for optical element molding die and producing method for optical element'20067,053,387'Pattern drawing method by scanning beam and pattern drawing apparatus'20067,001,709'Method of drawing a pattern on a base material by scanning a beam'20066,989,536'Electron-beam writing device and electron-beam writing method'20066,916,503'Base material to be coated, coating apparatus, coating method and element producing method'20055,360,156'Welding management apparatus'19945,265,787'Welding management apparatus'1993

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1993–2006Based in Tokyo, JP· patent location history
2006Patents assigned to KONICA CORP (2)· patent assignee history
2006–2007Based in Hino, JP· patent location history
2007–2011Patents assigned to KONICA MINOLTA HOLDINGS INC (6)· patent assignee history
2008–2021Based in Machida, JP· patent location history
2012–2016Patents assigned to MASUDA OSAMU (3)· patent assignee history
2012–2014Patents assigned to KOITO MFG CO LTD (2)· patent assignee history
2012–2014Based in Shizuoka, JP· patent location history
2016–2021Patents assigned to KONICA MINOLTA INC (2)· patent assignee history
2019Based in Nagoya, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
KONICA MINOLTA HOLDINGS INC62007–2011
MASUDA OSAMUself32012–2016
KOITO MFG CO LTD22012–2014
KONICA CORP22006
KONICA MINOLTA INC22016–2021
Locations
LocationPatentsSpan
Machida, JP72008–2021
Tokyo, JP41993–2006
Hino, JP32006–2007
Nagoya, JP22019
Shizuoka, JP22012–2014