Inventor

SUNG MIN KANG

Inventor

Overview

4→

Patents

2021–2024

Patent span

Performing operations

Primary field (CPC B)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Lprimary

H01LSemiconductor devices15%

A61KPreparations for medical, dental or toiletry purposes8%

A61PSpecific therapeutic activity of chemical compounds or medicinal preparations8%

B01DSeparation8%

B08BCleaning in general8%

B22FWorking metallic powder8%

B29CShaping or joining of plastics8%

B33YAdditive manufacturing, i.e. manufacturing of three-dimensional [3d] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3d printing, stereolithography or selective laser sintering8%

C07KPeptides8%

G09GArrangements or circuits for control of indicating devices using static means to present variable information8%

PatentTitleYear

12,042,8633D printer with residual powder removal device2024 11,795,199Peptide targeting 2023 11,569,206Integrated circuit chip, method of manufacturing the integrated circuit chip, and integrated circuit package and display apparatus including the integrated circuit chip2023 11,183,429Method of manufacturing a semiconductor device including forming a gate insulating material layer on a protection layer and removing the gate insulation material layer and the protection layer on the first region2021

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021–2023Patents assigned to SAMSUNG ELECTRONICS CO LTD (2)· patent assignee history

2021–2024Based in KR· patent location history

2023Patents assigned to SEOUL NAT UNIV R&DB FOUNDATION (1)· patent assignee history

2024Patents assigned to DAEGUNTECH CO LTD (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
SAMSUNG ELECTRONICS CO LTD	2	2021–2023
DAEGUNTECH CO LTD	1	2024
SEOUL NAT UNIV R&DB FOUNDATION	1	2023

Locations

Location	Patents	Span
KR	4	2021–2024