Inventor

Shoichiro Yoshida

Inventor

Kyoto, JP

Overview

2016

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C09Gprimary

C09GPolishing compositions25%

C09KMaterials for miscellaneous applications, not provided for elsewhere25%

H01LSemiconductor devices25%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2016Patents assigned to NITTA HAAS INC (1)· patent assignee history

2016Based in Kyoto, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
NITTA HAAS INC	1	2016

Locations

Location	Patents	Span
Kyoto, JP	1	2016