Inventor
Toshiyuki Uno
Inventor
Tokyo, JP
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices28%
B82YSpecific uses or applications of nanostructures18%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
G21KHandling of particles or ionising radiation not otherwise provided for8%
D01HSpinning or twisting5%
Y10TTechnical subjects covered by former us classification5%
B65HHandling thin or filamentary material, e.g. sheets, webs, cables3%
C03CChemical composition of glasses, glazes or vitreous enamels3%
C23CCoating metallic material3%
D02GCrimping or curling fibres, filaments, threads, or yarns3%
PatentTitleYear
10,254,640Reflective element for mask blank and process for producing reflective element for mask blank20199,097,976'Reflective mask blank for EUV lithography'20159,086,629'Substrate with conductive film, substrate with multilayer reflective film and reflective mask blank for EUV lithography'20158,956,787'Reflective mask blank for EUV lithography and process for producing the same'20158,288,062'Reflective mask blank for EUV lithography'20128,168,352'Reflective mask blank for EUV lithography and mask for EUV lithography'20128,029,950'Reflective mask blank for EUV lithography'20117,960,077'Reflective-type mask blank for EUV lithography'20117,712,333'Method for smoothing a surface of a glass substrate for a reflective mask blank used in EUV lithography'20107,678,511'Reflective-type mask blank for EUV lithography'20107,230,695'Defect repair device and defect repair method'20076,383,695'Black matrix for liquid crystal display devices and color filter'20025,588,602'Package changing system for supplying and discharging loaded and empty packages to and from a machine frame'19964,993,219'False twist processing apparatus'19914,888,945'Method for quality control of textured yarn'1989Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1989–1996Patents assigned to MURATA MACHINERY LTD (3)· patent assignee history
1989–1996Based in Kusatsu, JP· patent location history
2002–2019Patents assigned to ASAHI GLASS CO LTD (12)· patent assignee history
2002Based in Kanagawa, JP· patent location history
2007–2011Based in Guilderland, NY, US· patent location history
2011–2015Based in Tokyo, JP· patent location history
2012–2015Patents assigned to HAYASHI KAZUYUKI (3)· patent assignee history
2012–2015Patents assigned to UNO TOSHIYUKI (3)· patent assignee history
2015–2019Based in Chiyoda-ku, JP· patent location history
2019Patents assigned to AGC INC (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASAHI GLASS CO LTD | 12 | 2002–2019 |
| HAYASHI KAZUYUKI | 3 | 2012–2015 |
| MURATA MACHINERY LTD | 3 | 1989–1996 |
| UNO TOSHIYUKIself | 3 | 2012–2015 |
| AGC INC | 1 | 2019 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 4 | 2011–2015 |
| Guilderland, New York, US | 4 | 2007–2011 |
| Chiyoda-ku, JP | 3 | 2015–2019 |
| Kusatsu, JP | 3 | 1989–1996 |
| Kanagawa, JP | 1 | 2002 |