Inventor
VARUN SHARMA
Inventor
FI
Overview
Patents· 53 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%
H01LSemiconductor devices18%
C23CCoating metallic material11%
H01JElectric discharge tubes or discharge lamps8%
G06FElectric digital data processing6%
C23FNon-mechanical removal of metallic material from surface6%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%
C09KMaterials for miscellaneous applications, not provided for elsewhere4%
H04LTransmission of digital information, e.g. telegraphic communication3%
B05DProcesses for applying fluent materials to surfaces, in general2%
PatentTitleYear
12,595,555Toposelective vapor deposition using an inhibitor202612,549,587Correlating outbound traffic and file events with a CI/CD pipeline202612,492,472Methods for depositing material within a gap using an inhibitor202512,423,872System, method, and apparatus for generating tokenized images202512,412,109Machine learning deployment platform202512,394,634Etch process and a processing assembly202512,394,630In situ generation process and system202512,341,005Formation of SiCN thin films202512,320,012Thermal atomic layer etching processes202512,312,696Thermal atomic layer etching processes202512,300,505Deposition of organic films202512,237,182Showerhead device for semiconductor processing system202512,234,548Methods of forming copper iodide layer and structures including copper iodide layer202512,217,954Method of cleaning a surface202512,205,820Deposition of organic films202512,148,609Silicon oxide deposition method202412,142,479Formation of SiOCN thin films202412,136,552Toposelective vapor deposition using an inhibitor202412,094,686Atomic layer etching processes202412,038,965Methods, systems, and media for identifying abusive user accounts based on playlists202412,040,195Atomic layer etching202412,032,953Techniques for patching in a distributed computing system202412,021,869Embedding credentials in network addresses202412,014,526System, method, and apparatus for generating tokenized images202411,956,977Atomic layer deposition of III-V compounds to form V-NAND devices202411,948,813Showerhead device for semiconductor processing system202411,907,515Digital image object anchor points202411,816,353Parity data for non-volatile storage202311,769,670Methods for forming a rhenium-containing film on a substrate by a cyclical deposition process and related semiconductor device structures202311,739,428Thermal atomic layer etching processes202311,739,422Passivation against vapor deposition202311,739,427Thermal atomic layer etching processes202311,728,175Deposition of organic films202311,687,409Data storage device and method for data protection using XOR parity202311,664,222Atomic layer deposition of indium gallium zinc oxide202311,657,410Method, system, and computer program product for wait time estimation using predictive modeling202311,640,899Atomic layer etching processes202311,574,813Atomic layer etching202311,567,987Methods, systems, and media for identifying abusive user accounts based on playlists202311,438,387Access management system with a security maintenance manager202211,437,249Showerhead device for semiconductor processing system202211,396,701Passivation against vapor deposition202211,387,120Chemical dispensing apparatus and methods for dispensing a chemical to a reaction chamber202211,387,107Deposition of organic films202211,381,560Embedding credentials in network addresses202211,372,529Digital image object anchor points202211,283,809Automatic reduction of privilege role assignments202211,281,763Integrated development environment information sharing for authentication provisioning202211,230,770Thermal atomic layer etching processes202211,230,769Thermal atomic layer etching processes202211,183,367Atomic layer etching processes202111,158,513Methods for forming a rhenium-containing film on a substrate by a cyclical deposition process and related semiconductor device structures202111,139,308Atomic layer deposition of III-V compounds to form V-NAND devices2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to ASM IP HOLDING BV (35)· patent assignee history
2021–2026Based in FI· patent location history
2022–2025Patents assigned to VISA INT SERVICE ASS (5)· patent assignee history
2022Patents assigned to MICROSOFT TECHNOLOGY LICENSING LLC (3)· patent assignee history
2022–2024Patents assigned to ADOBE INC (2)· patent assignee history
2022–2026Based in US· patent location history
2022–2024Based in IN· patent location history
2023–2024Patents assigned to GOOGLE LLC (2)· patent assignee history
2023–2024Based in CH· patent location history
2025Based in CA· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASM IP HOLDING BV | 35 | 2021–2025 |
| VISA INT SERVICE ASS | 5 | 2022–2025 |
| MICROSOFT TECHNOLOGY LICENSING LLC | 3 | 2022 |
| ADOBE INC | 2 | 2022–2024 |
| GOOGLE LLC | 2 | 2023–2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| FI | 36 | 2021–2026 |
| US | 9 | 2022–2026 |
| IN | 5 | 2022–2024 |
| CH | 2 | 2023–2024 |
| CA | 1 | 2025 |