Inventor
Markus Gerardus Martinus Maria Van Kraaij
Inventor
Eindhoven, NL
Overview
Patents· 21 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices41%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
G01NInvestigating or analysing materials by determining their chemical or physical properties14%
G06TImage data processing or generation, in general6%
G06FElectric digital data processing4%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
G01BMeasuring length, thickness or similar linear dimensions2%
G06NComputing arrangements based on specific computational models2%
H01LSemiconductor devices2%
PatentTitleYear
10,795,269Method of determining a value of a parameter of interest, method of cleaning a signal containing information about a parameter of interest, device manufacturing method202010,761,432Inspection apparatus and methods, substrates having metrology targets, lithographic system and device manufacturing method202010,732,513Method and apparatus for image analysis202010,725,386Metrology method and apparatus, lithographic system and device manufacturing method202010,649,345Methods and apparatuses for measurement of a parameter of a feature fabricated on a substrate202010,627,723Yield estimation and control202010,607,334Method and apparatus for image analysis202010,592,618Methods and apparatus for simulating interaction of radiation with structures, metrology methods and apparatus, device manufacturing method202010,437,157Method and apparatus for image analysis201910,331,041Metrology method and apparatus, lithographic system and device manufacturing method201910,241,055Method and apparatus for angular-resolved spectroscopic lithography characterization201910,146,140Methods and apparatus for simulating interaction of radiation with structures, metrology methods and apparatus, device manufacturing method201810,126,662Metrology method and apparatus, lithographic system and device manufacturing method20189,958,791Inspection apparatus and methods, substrates having metrology targets, lithographic system and device manufacturing method20189,910,366'Metrology method and apparatus, lithographic system and device manufacturing method'20188,760,662'Method and apparatus for angular-resolved spectroscopic lithography characterization'20148,645,109'Methods and apparatus for determining electromagnetic scattering properties and structural parameters of periodic structures'20148,553,230'Method and apparatus for angular-resolved spectroscopic lithography characterization'20138,054,467'Method and apparatus for angular-resolved spectroscopic lithography characterization'20117,791,732'Method and apparatus for angular-resolved spectroscopic lithography characterization'20107,791,724'Characterization of transmission losses in an optical system'2010Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2010–2020Patents assigned to ASML NETHERLANDS BV (21)· patent assignee history
2010–2019Based in Mierlo, NL· patent location history
2013Patents assigned to BLEEKER ARNO JAN (1)· patent assignee history
2013Patents assigned to DEN BOEF ARIE JEFFREY MARIA (1)· patent assignee history
2013Patents assigned to DUSA MIRCEA (1)· patent assignee history
2014Patents assigned to DIRKS REMCO (1)· patent assignee history
2014–2020Based in Eindhoven, NL· patent location history
2018–2020Based in Veldhoven, NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 21 | 2010–2020 |
| BLEEKER ARNO JAN | 1 | 2013 |
| DEN BOEF ARIE JEFFREY MARIA | 1 | 2013 |
| DIRKS REMCO | 1 | 2014 |
| DUSA MIRCEA | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Eindhoven, NL | 8 | 2014–2020 |
| Veldhoven, NL | 7 | 2018–2020 |
| Mierlo, NL | 6 | 2010–2019 |