Inventor
Rongwei Fan
Inventor
Shanghai, CN
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
H01LSemiconductor devices33%
G01RMeasuring electric variables17%
PatentTitleYear
9,269,639'Method of detecting and measuring contact alignment shift relative to gate structures in a semicondcutor device'20168,987,013'Method of inspecting misalignment of polysilicon gate'20158,658,438'Measurement of lateral diffusion of implanted ions in doped well region of semiconductor devices'2014Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2014–2016Patents assigned to SHANGHAI HUALI MICROELECT CORP (3)· patent assignee history
2014–2016Based in Shanghai, CN· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHANGHAI HUALI MICROELECT CORP | 3 | 2014–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Shanghai, CN | 3 | 2014–2016 |