Inventor

Shinji Nagashima

Inventor

Kikuchi-gun, JP

Overview

28→

Patents

1998–2021

Patent span

Electricity

Primary field (CPC H)

Patents· 28 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1041%

B05DProcesses for applying fluent materials to surfaces, in general15%

B05CApparatus for applying fluent materials to surfaces, in general12%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%

G11CStatic stores3%

H01LSemiconductor devices3%

H10BElectronic memory devices3%

H10DInorganic electric semiconductor devices3%

Y10TTechnical subjects covered by former us classification3%

C30BSingle-crystal growth2%

PatentTitleYear

11,088,162Semiconductor memory device and semiconductor device manufacturing method2021 11,049,868Stacked type semiconductor memory device2021 7,520,936'Hardening processing apparatus, hardening processing method, and coating film forming apparatus'2009 7,205,024'Method of coating film, coating unit, aging unit, solvent replacement unit, and apparatus for coating film'2007 6,982,002'Apparatus and method for forming coating film'2006 6,979,474'Heat treatment method, heat treatment apparatus and treatment system'2005 6,827,973'Substrate processing method'2004 6,808,567'Gas treatment apparatus'2004 6,786,974'Insulating film forming method and insulating film forming apparatus'2004 6,730,620'Substrate processing method and substrate processing apparatus'2004 6,726,775'Method of coating film, coating unit, aging unit, solvent replacement unit, and apparatus for coating film'2004 6,673,155'Apparatus for forming coating film and apparatus for curing the coating film'2004 6,665,952'Method for heat processing of substrate'2003 6,660,096'Gas treatment apparatus'2003 6,605,550'Substrate processing method and substrate processing apparatus'2003 6,590,186'Heat treatment apparatus and method'2003 6,589,339'Method of coating film, coating unit, aging unit, solvent replacement unit, and apparatus for coating film'2003 6,573,191'Insulating film forming method and insulating film forming apparatus'2003 6,564,474'Apparatus for heat processing of substrate'2003 6,501,191'Heat treatment apparatus and method'2002 6,419,751'Substrate processing method and substrate processing apparatus'2002 6,413,317'Substrate processing method and substrate processing apparatus'2002 6,350,316'Apparatus for forming coating film'2002 6,261,365'Heat treatment method, heat treatment apparatus and treatment system'2001 6,248,168'Spin coating apparatus including aging unit and solvent replacement unit'2001 6,197,385'Film forming apparatus, substrate conveying apparatus, film forming method, and substrate conveying method'2001 6,190,459'Gas treatment apparatus'2001 5,826,129'Substrate processing system'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–2009Patents assigned to TOKYO ELECTRON LTD (26)· patent assignee history

1998–2009Based in Kumamoto, JP· patent location history

2001–2007Based in Kikuchi-gun, JP· patent location history

2002–2004Based in Suwa, JP· patent location history

2021Patents assigned to TOSHIBA MEMORY CORP (2)· patent assignee history

2021Based in Yokkaichi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
TOKYO ELECTRON LTD	26	1998–2009
TOSHIBA MEMORY CORP	2	2021

Locations

Location	Patents	Span
Kikuchi-gun, JP	12	2001–2007
Kumamoto, JP	10	1998–2009
Suwa, JP	4	2002–2004
Yokkaichi, JP	2	2021