Inventor

William Williams, III

Inventor
Ipswich, MA, US

Overview

15→
Patents
2001–2020
Patent span
Chemistry
Primary field (CPC C)

Patents· 15 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices22%
C07CAcyclic or carbocyclic compounds19%
C07DHeterocyclic compounds19%
LOC2513%
C08LCompositions of macromolecular compounds6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
LOC286%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds3%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light3%
LOC063%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001Based in Annandale, NJ, US· patent location history
2011Patents assigned to FLIR SYSTEMS (1)· patent assignee history
2011Based in Melbourne, FL, US· patent location history
2012–2019Patents assigned to WILLIAMS III WILLIAM E (6)· patent assignee history
2012–2014Based in Wylie, TX, US· patent location history
2014–2020Patents assigned to ROHM & HAAS ELECT MAT (7)· patent assignee history
2014–2020Based in Ipswich, MA, US· patent location history
2019Based in Garland, TX, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ROHM & HAAS ELECT MAT72014–2020
WILLIAMS III WILLIAM Eself62012–2019
FLIR SYSTEMS12011
Locations
LocationPatentsSpan
Ipswich, Massachusetts, US72014–2020
Wylie, Texas, US42012–2014
Garland, Texas, US22019
Melbourne, Florida, US12011
Annandale, New Jersey, US12001