Inventor
Shinji Miyagaki
Inventor
Kawasaki, JP
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
H10DInorganic electric semiconductor devices27%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation13%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests13%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h107%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution7%
PatentTitleYear
7,741,684'Semiconductor device and method for fabricating the same'20106,946,351'Method for fabricating a semiconductor device'20056,188,090'Semiconductor device having a heteroepitaxial substrate'20015,834,362'Method of making a device having a heteroepitaxial substrate'19985,492,860'Method for growing compound semiconductor layers'19965,094,978'Method of patterning a transparent conductor'19925,093,564'Photosensor having an amorphous silicon photoabsorption layer'19925,066,612'Method of forming wiring of a semiconductor device'1991Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1991–2010Patents assigned to FUJITSU LTD (8)· patent assignee history
1991–1992Based in Tokyo, JP· patent location history
1996–2010Based in Kawasaki, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJITSU LTD | 8 | 1991–2010 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kawasaki, JP | 5 | 1996–2010 |
| Tokyo, JP | 3 | 1991–1992 |