Inventor
Koichi Ando
Inventor
Tokyo, JP
Overview
Patents· 26 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices20%
H04NPictorial communication, e.g. television10%
H10BElectronic memory devices8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
G03GElectrography6%
G06QInformation and communication technology [ict] specially adapted for administrative, commercial, financial, managerial or supervisory purposes6%
G07CTime or attendance registers6%
B60RVehicles, vehicle fittings, or vehicle parts, not otherwise provided for4%
G06FElectric digital data processing4%
G11CStatic stores4%
PatentTitleYear
10,915,053Management system, management method, and management server202110,810,814Delivery system, information processing device, control method for information processing device, and non-transitory recording medium having program stored therein202010,752,208Information system, information processing device, information processing method, and non-transitory recording medium having program stored therein202010,755,502Trunk-sharing system, information processing device for trunk-sharing, information processing method for trunk-sharing, and recording medium having program stored therein202010,031,792Flash memory20189,544,413'Electronic device, control method, and control program'20177,773,428'Nonvolatile semiconductor memory having suitable crystal orientation'20107,538,914'Image reading apparatus'20097,345,795'System and method for scanning or reading documents having both color and monochromatic pages'20087,071,512'Non-volatile semiconductor memory device'20066,879,414'Scanner unit and carriage therefor'20056,845,911'Optical reader'20056,794,258'High-performance MOS transistor of LDD structure having a gate insulating film with a nitride central portion and oxide end portions'20046,614,081'High-performance MOS transistor of LDD structure having a gate insulating film with a nitride central portion and oxide end portions'20036,603,179'Semiconductor apparatus including CMOS circuits and method for fabricating the same'20036,475,862'Semiconductor device having gate insulating layers different in thickness and material and process for fabrication thereof'20026,258,731'Method for fabricating oxide film'20015,691,220'Process of fabricating semiconductor device having capacitor electrode implanted with boron difluoride'19975,492,854'Method of manufacturing semiconductor device'19965,438,541'Semiconductor dynamic random access memory cell free from leakage between accumulating electrode and counter electrode'19955,349,494'Semiconductor device with capacitor insulating film and method for fabricating the same'19945,326,092'Apparatus for conveying a paper along with a paper conveying path'19945,182,472'Logic circuit with bipolar CMOS configuration'19935,016,560'Device for image toner distribution on a developing device'19914,741,863'Alkaline degreasing solution comprising amine oxides'19884,267,155'Process for cleaning flue gas'1981Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1988–2020Patents assigned to TOYOTA MOTOR CO LTD (4)· patent assignee history
1991–2009Patents assigned to TOSHIBA KK (6)· patent assignee history
1993–2002Patents assigned to NEC CORP (7)· patent assignee history
1993–2021Based in Tokyo, JP· patent location history
1994–2010Based in Kanagawa, JP· patent location history
2003–2010Patents assigned to NEC ELECTRONICS CORP (5)· patent assignee history
2005–2009Patents assigned to TOSHIBA TEC KK (4)· patent assignee history
2005Based in Kamakura, JP· patent location history
2008–2009Based in Shizuoka, JP· patent location history
2020Based in Nagoya, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NEC CORP | 7 | 1993–2002 |
| TOSHIBA KK | 6 | 1991–2009 |
| NEC ELECTRONICS CORP | 5 | 2003–2010 |
| TOSHIBA TEC KK | 4 | 2005–2009 |
| TOYOTA MOTOR CO LTD | 4 | 1988–2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 12 | 1993–2021 |
| Nagoya, JP | 3 | 2020 |
| Kanagawa, JP | 3 | 1994–2010 |
| Shizuoka, JP | 2 | 2008–2009 |
| Kamakura, JP | 2 | 2005 |