Inventor
Ersin Altintas
Inventor
Tokyo, JP
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
A61Bprimary
A61BDiagnosis35%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light20%
G01BMeasuring length, thickness or similar linear dimensions10%
G01NInvestigating or analysing materials by determining their chemical or physical properties10%
G06KGraphical data reading10%
G06VImage or video recognition or understanding10%
G06FElectric digital data processing5%
PatentTitleYear
11,000,219Electrocardiogram measurement apparatus and electrocardiogram measurement method202110,591,407Excrement analysis device, toilet provided with said analysis device, and method for analyzing excrement202010,545,016Light measurement device and optical axis adjustment method202010,503,958Living body determination device, living body determination method, and program201910,429,244Light measurement device201910,390,712Blood pressure measurement device, blood pressure measurement method, and non-transitory recording medium201910,268,874Biometric authentication apparatus and biometric authentication method201910,194,811Blood pressure measurement device, blood pressure measurement method, and non-transitory recording medium20199,848,782Blood pressure estimation device, blood pressure estimation method, blood pressure measurement device, and recording medium2017Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2017–2021Patents assigned to NEC CORP (9)· patent assignee history
2017–2021Based in Tokyo, JP· patent location history
2020Patents assigned to UNIV KAGAWA NAT UNIV CORP (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NEC CORP | 9 | 2017–2021 |
| UNIV KAGAWA NAT UNIV CORP | 1 | 2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 9 | 2017–2021 |