Inventor
Katsumi Ohmori
Inventor
Kawasaki, JP
Overview
Patents· 12 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices17%
C08LCompositions of macromolecular compounds11%
C09DCoating compositions, e.g. paints, varnishes or lacquers11%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
B82YSpecific uses or applications of nanostructures8%
H01LSemiconductor devices8%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems6%
B05DProcesses for applying fluent materials to surfaces, in general4%
G02BOptical elements, systems or apparatus4%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds2%
PatentTitleYear
11,016,365Lens apparatus and imaging system using the same202110,366,888Pattern forming method201910,317,797Pattern forming method for forming a pattern201910,139,587Lens barrel and optical apparatus201810,101,660Methods of forming patterns of semiconductor devices201810,100,221Method of producing structure containing phase-separated structure, block copolymer composition, and organic solvent used for block copolymer composition201810,066,096Method of producing structure containing phase-separated structure and resin composition for forming phase-separated structure20189,834,696Undercoat agent and method of forming pattern of layer containing block copolymer20179,816,003'Method of producing structure containing phase-separated structure'20179,475,088'Method of producing structure containing phase-separated structure, phase separated structure, and block copolymer composition'20169,459,535'Method of forming pattern'20169,169,421'Method of producing structure containing phase-separated structure, method of forming pattern, and top coat material'2015Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2015–2019Patents assigned to TOKYO OHKA KOGYO CO LTD (10)· patent assignee history
2015–2018Based in Kawasaki, JP· patent location history
2016–2019Patents assigned to TOKYO ELECTRON LTD (3)· patent assignee history
2018–2021Patents assigned to CANON KK (2)· patent assignee history
2018Patents assigned to KIM EUN SUNG (1)· patent assignee history
2018Patents assigned to KUROSAWA Tsuyosh (1)· patent assignee history
2018–2019Based in Kanagawa, JP· patent location history
2018–2021Based in Utsunomiya, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO OHKA KOGYO CO LTD | 10 | 2015–2019 |
| TOKYO ELECTRON LTD | 3 | 2016–2019 |
| CANON KK | 2 | 2018–2021 |
| KIM EUN SUNG | 1 | 2018 |
| KUROSAWA Tsuyosh | 1 | 2018 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kawasaki, JP | 7 | 2015–2018 |
| Kanagawa, JP | 3 | 2018–2019 |
| Utsunomiya, JP | 2 | 2018–2021 |