Inventor

Andrew W. McCullough

Inventor

Newtown, CT, US

Overview

23→

Patents

1992–2008

Patent span

Physics

Primary field (CPC G)

Patents· 23 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices55%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%

B82YSpecific uses or applications of nanostructures10%

F28FDetails of heat-exchange and heat-transfer apparatus, of general application2%

PatentTitleYear

7,403,266'Maskless lithography systems and methods utilizing spatial light modulator arrays'2008 7,105,836'Method and apparatus for cooling a reticle during lithographic exposure'2006 7,092,070'Illumination system with spatially controllable partial coherence compensating for line width variances'2006 7,029,804'Non absorbing reticle and method of making same'2006 7,014,963'Non absorbing reticle and method of making same'2006 6,967,713'Use of multiple reticles in lithographic printing tools'2005 6,822,728'Illumination system with spatially controllable partial coherence compensation for line width variances in a photolithographic system'2004 6,800,408'Use of multiple reticles in lithographic printing tools'2004 6,686,101'Non absorbing reticle and method of making same'2004 6,628,372'Use of multiple reticles in lithographic printing tools'2003 6,628,370'Illumination system with spatially controllable partial coherence compensating for line width variances in a photolithographic system'2003 6,444,372'Non absorbing reticle and method of making same'2002 6,445,439'EUV reticle thermal management'2002 6,292,255'Dose correction for along scan linewidth variation'2001 6,259,513'Illumination system with spatially controllable partial coherence'2001 6,097,474'Dynamically adjustable high resolution adjustable slit'2000 6,013,401'Method of controlling illumination field to reduce line width variation'2000 5,973,764'Vacuum assisted debris removal system'1999 5,966,202'Adjustable slit'1999 5,895,737'Method for adjusting an illumination field based on selected reticle feature'1999 5,896,188'Reduction of pattern noise in scanning lithographic system illuminators'1999 5,767,523'Multiple detector alignment system for photolithography'1998 5,079,131'Method of forming positive images through organometallic treatment of negative acid hardening cross-linked photoresist formulations'1992

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1992Patents assigned to SHIPLEY CO (1)· patent assignee history

1992Based in Brighton, MA, US· patent location history

1998–2002Patents assigned to SVG LITHOGRAPHY SYSTEMS INC (11)· patent assignee history

1998–2008Based in Newtown, CT, US· patent location history

2004–2008Patents assigned to ASML HOLDING NV (9)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
SVG LITHOGRAPHY SYSTEMS INC	11	1998–2002
ASML HOLDING NV	9	2004–2008
SHIPLEY CO	1	1992

Locations

Location	Patents	Span
Newtown, CT, US	22	1998–2008
Brighton, Massachusetts, US	1	1992