Inventor

Soonam Park

Inventor

Sunnyvale, CA, US

Overview

2010–2020

Patent span

Electricity

Primary field (CPC H)

Patents· 50 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary

H01JElectric discharge tubes or discharge lamps30%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%

H01LSemiconductor devices17%

C23CCoating metallic material13%

G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light3%

G01NInvestigating or analysing materials by determining their chemical or physical properties3%

C23FNon-mechanical removal of metallic material from surface3%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%

B05BSpraying apparatus2%

H05BElectric heating2%

PatentTitleYear

10,796,922Systems and methods for internal surface conditioning assessment in plasma processing equipment2020 10,707,061Systems and methods for internal surface conditioning in plasma processing equipment2020 10,593,523Systems and methods for internal surface conditioning in plasma processing equipment2020 10,593,560Magnetic induction plasma source for semiconductor processes and equipment2020 10,550,472Flow control features of CVD chambers2020 10,551,328Ceramic ring test device2020 10,541,184Optical emission spectroscopic techniques for monitoring etching2020 10,522,371Systems and methods for improved semiconductor etching and component protection2019 10,504,754Systems and methods for improved semiconductor etching and component protection2019 10,504,697Particle generation suppresor by DC bias modulation2019 10,504,700Plasma etching systems and methods with secondary plasma injection2019 10,490,418Systems and methods for internal surface conditioning assessment in plasma processing equipment2019 10,468,285High temperature chuck for plasma processing systems2019 10,460,915Rotatable substrate support having radio frequency applicator2019 10,453,655Plasma reactor having digital control over rotation frequency of a microwave field with direct up-conversion2019 10,431,429Systems and methods for radial and azimuthal control of plasma uniformity2019 10,354,843Chemical control features in wafer process equipment2019 10,340,124Generalized cylindrical cavity system for microwave rotation and impedance shifting by irises in a power-supplying waveguide2019 10,319,649Optical emission spectroscopy (OES) for remote plasma monitoring2019 10,153,133Plasma reactor having digital control over rotation frequency of a microwave field with direct up-conversion2018 10,032,606Semiconductor processing with DC assisted RF power for improved control2018 9,978,564Chemical control features in wafer process equipment2018 9,966,240Systems and methods for internal surface conditioning assessment in plasma processing equipment2018 9,947,549Cobalt-containing material removal2018 9,922,840'Adjustable remote dissociation'2018 9,892,888'Particle generation suppresor by DC bias modulation'2018 9,874,524In-situ spatially resolved plasma monitoring by using optical emission spectroscopy2018 9,846,130Ceramic ring test device2017 9,837,249Radial waveguide systems and methods for post-match control of microwaves2017 9,773,648'Dual discharge modes operation for remote plasma'2017 9,728,437'High temperature chuck for plasma processing systems'2017 9,711,366'Selective etch for metal-containing materials'2017 9,659,753'Grooved insulator to reduce leakage current'2017 9,593,421'Particle generation suppressor by DC bias modulation'2017 9,564,296'Radial waveguide systems and methods for post-match control of microwaves'2017 9,472,417'Plasma-free metal etch'2016 9,460,898'Plasma generation chamber with smooth plasma resistant coating'2016 9,384,997'Dry-etch selectivity'2016 9,373,517'Semiconductor processing with DC assisted RF power for improved control'2016 9,355,922'Systems and methods for internal surface conditioning in plasma processing equipment'2016 9,299,538'Radial waveguide systems and methods for post-match control of microwaves'2016 9,299,537'Radial waveguide systems and methods for post-match control of microwaves'2016 9,299,582'Selective etch for metal-containing materials'2016 9,132,436'Chemical control features in wafer process equipment'2015 9,117,855'Polarity control for remote plasma'2015 8,969,212'Dry-etch selectivity'2015 8,894,767'Flow control features of CVD chambers'2014 7,989,365'Remote plasma source seasoning'2011 7,799,704'Gas baffle and distributor for semiconductor processing chamber'2010 7,740,706'Gas baffle and distributor for semiconductor processing chamber'2010

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010–2020Patents assigned to APPLIED MATERIALS INC (50)· patent assignee history

2010–2020Based in Sunnyvale, CA, US· patent location history

2011–2018Based in Mountain View, CA, US· patent location history

2014Patents assigned to CHEN XINGLONG (1)· patent assignee history

2014Patents assigned to CHUC KIEN N (1)· patent assignee history

2014Patents assigned to KHAN ADIB (1)· patent assignee history

2014Patents assigned to LIANG QIWEI (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
APPLIED MATERIALS INC	50	2010–2020
CHEN XINGLONG	1	2014
CHUC KIEN N	1	2014
KHAN ADIB	1	2014
LIANG QIWEI	1	2014

Locations

Location	Patents	Span
Sunnyvale, California, US	44	2010–2020
Mountain View, California, US	6	2011–2018