Inventor
Joerg Reiss
Inventor
Sunnyvale, CA, US
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1027%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices18%
H10DInorganic electric semiconductor devices18%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests18%
H10BElectronic memory devices9%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
PatentTitleYear
7,108,946'Method of lithographic image alignment for use with a dual mask exposure technique'20067,091,088'UV-blocking etch stop layer for reducing UV-induced charging of charge storage layer in memory devices in BEOL processing'20067,071,085'Predefined critical spaces in IC patterning to reduce line end pull back'20067,027,130'Device and method for determining an illumination intensity profile of an illuminator for a lithography system'20067,015,148'Reduce line end pull back by exposing and etching space after mask one trim and etch'20066,995,433'Microdevice having non-linear structural component and method of fabrication'2006Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2006Patents assigned to ADVANCED MICRO DEVICES INC (5)· patent assignee history
2006Patents assigned to SPANSION LLC (1)· patent assignee history
2006Based in Sunnyvale, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ADVANCED MICRO DEVICES INC | 5 | 2006 |
| SPANSION LLC | 1 | 2006 |
Locations
| Location | Patents | Span |
|---|---|---|
| Sunnyvale, California, US | 6 | 2006 |